Photosensitive composition suitable for heat-sensitive positive computer to plate (CTP) and lithographic plate containing same

A heat-sensitive positive image and composition technology, applied in the field of lithographic printing plates, can solve the problems of affecting the plate durability, poor wear resistance, and low thermal stability, and achieve excellent drug resistance, large developing latitude, and high resistance to printing. Alkaline good effect

Active Publication Date: 2010-07-07
LUCKY HUAGUANG GRAPHICS
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] The thermoplastic phenolic resin used as a film-forming resin in lithographic printing plates has the following defects: poor adhesion to the plate base, brittle surface film, poor wear resistance, and low printing durability when used as a lithographic printing plate
However, the alkali-resistant film retention rate of the plate is low, which affects the printing durability of the plate
[0010] The presence of thermal acid release agents is essential in the composition of thermal CTP plates, but the traditional thermal acid

Method used

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  • Photosensitive composition suitable for heat-sensitive positive computer to plate (CTP) and lithographic plate containing same
  • Photosensitive composition suitable for heat-sensitive positive computer to plate (CTP) and lithographic plate containing same
  • Photosensitive composition suitable for heat-sensitive positive computer to plate (CTP) and lithographic plate containing same

Examples

Experimental program
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Effect test

Synthetic example 1

[0070] In a 500ml three-neck flask equipped with a stirrer, a reflux tube, and a dropping funnel, add 20g of N,N-dimethylformamide and 2.2g of benzoyl peroxide. Use a hot water bath while heating to 78 ° C, while passing nitrogen protection. Add dropwise from 20gN, N-dimethylformamide, 70g N-(4-hydroxybenzene) methacrylamide, 29g N-(4-sulfonamidobenzene) maleimide, 1g N-(4- Acetoxyphenyl) maleimide mixed solution, 2 hours dropwise. React at constant temperature for 10 hours. After the reaction was completed, 200 g of methanol was added, cooled, added to 2 L of water with stirring, and filtered and dried after stirring for 1 hour to obtain 90.66 g of a white solid. The weight-average molecular weight (polystyrene standard) of the high molecular weight polymer measured by silica gel permeation chromatography was 40,000.

Synthetic example 2

[0072]In a 500ml four-neck flask equipped with a stirrer, a reflux tube, and a dropping funnel, add 20g of N,N-dimethylformamide and 2.2g of benzoyl peroxide. Use a hot water bath while heating to 78 ° C, while passing nitrogen protection. Add dropwise by 130g N, N-dimethylformamide, 1g N-(4-hydroxybenzene) methacrylamide, 1g N-(4-sulfonamidobenzene) maleimide, 50g N-(4 -Acetoxyphenyl) maleimide, the mixed solution that 48g methyl methacrylate forms, dropwise in 2 hours. React at constant temperature for 10 hours. After the reaction was completed, 200 g of methanol was added, cooled, added to 2 L of water with stirring, and filtered and dried after stirring for 1 hour to obtain 90.68 g of a white solid. The weight-average molecular weight (polystyrene standard) of the high molecular weight polymer measured by silica gel permeation chromatography was 50,000.

Synthetic example 3

[0074] In a 500ml four-neck flask equipped with a stirrer, a reflux tube, and a dropping funnel, add 20g of N,N-dimethylformamide and 2.2g of benzoyl peroxide. Use a hot water bath while heating to 78 ° C, while passing nitrogen protection. Add dropwise from 130g N, N-dimethylformamide, 70g N-(4-hydroxybenzene) methacrylamide, 20g N-(4-sulfonamidobenzene) maleimide, 1g N-(4 -Acetoxyphenyl) maleimide, the mixed solution that 9g methyl methacrylate forms, dropwise in 2 hours. React at constant temperature for 10 hours. After the reaction was completed, 200 g of methanol was added, cooled, added to 2 L of water with stirring, stirred for 1 hour, filtered and dried to obtain 89.00 g of a white solid. The weight-average molecular weight (polystyrene standard) of the high molecular weight polymer measured by silica gel permeation chromatography was 60,000.

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Abstract

The invention discloses a photosensitive composition suitable for heat-sensitive positive computer to plate (CTP) and a lithographic plate containing the same. The composition comprises the following components in part by weight: 30 to 80 parts of anti-solvent vinyl polymer, 3 to 20 parts of infrared absorbing dye, 5 to 35 parts of vinyl sulfonate polymer and 0.5 to 5 parts of cellulosic derivative. The lithographic plate consisting of the photosensitive composition has the characteristics of high photosensitivity, good storage stability, high development latitude, good abrasion resistance of plate coating, and high durability; besides, the plate coating has good chemical resistant performance and is suitable for UV ink printing. The durability of the plate using the photosensitive composition reaches over 200,000 printings by using the normal lithographic ink printing and 50,000 printings by using the UV oil printing; and pollution is avoided during printing.

Description

technical field [0001] The invention belongs to the technical field of printing, and in particular relates to a photosensitive composition suitable for thermal positive CTP and a lithographic printing plate containing the composition. Background technique [0002] The printing principle of the lithographic plate is to absorb ink through the coating material on the upper part of the plate, and absorb water in the blank part to achieve the purpose of repelling water transfer printing ink. The preparation of lithographic printing plates is well known in the printing industry. In the past, the plate-making process of lithographic plates required at least two steps to complete: one is to produce a film (such as: positive film and negative film mask), which contains all the graphic information; the other is to obtain the above process. The film (such as positive film and negative film mask) is exposed on the photosensitive lithographic plate under the condition of vacuuming, and ...

Claims

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Application Information

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IPC IPC(8): G03F7/027G03F7/09
Inventor 刘伟滕方迁柴廷会孔祥丽吴东景王群英
Owner LUCKY HUAGUANG GRAPHICS
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