Method for preparing organic-dissolvable photosensitive chitosan derivate

A technology of chitosan derivatives and organic dissolution is applied in the field of preparation of organic-soluble photosensitive chitosan derivatives, and can solve the problem of reducing the application value of chitosan derivatives, many by-products in the reaction, and high energy consumption, etc. problems, to achieve the effect of good UV absorption, saving raw materials and costs, and increasing the scope of application

Inactive Publication Date: 2010-07-14
HANGZHOU INST OF ADVANCED MATERIAL BEIJING UNIV OF CHEM TECH
View PDF5 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] The above methods have the following disadvantages: 1, the preparation method is complex and requires a catalyst, and the aftertreatment is troublesome, which increases the cost and reduces the application value of chitosan derivatives;

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Method for preparing organic-dissolvable photosensitive chitosan derivate
  • Method for preparing organic-dissolvable photosensitive chitosan derivate
  • Method for preparing organic-dissolvable photosensitive chitosan derivate

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0028] 2g chitosan (degree of deacetylation DP=80%, weight average molecular weight Mw=500,000) is added in the triethylamine of 70ml, stirs at room temperature, chitosan is evenly dispersed in triethylamine; Add cinnamoyl chloride In the carbon tetrachloride solution, be prepared with the carbon tetrachloride solution of cinnamoyl chloride, wherein the addition of photosensitive acyl chloride monomer is 0.5 times of the molar number of amino, imino and hydroxyl groups on chitosan; the photosensitive acyl chloride The carbon tetrachloride solution of quasi-monomer was slowly added dropwise in the chitosan solution, and kept stirring; after all the dropwise addition was completed, the reaction was continued for 6h, and after the reaction was completed, suction filtration was carried out to obtain a powdery solid, and then used Wash 3 times with 8wt% sodium bicarbonate solution, filter the washed product, and vacuum dry to obtain a photosensitive chitosan derivative with a substi...

Embodiment 2

[0034]2g chitosan (degree of deacetylation DP=70%, weight average molecular weight Mw=1,000,000) is added in the triethylamine of 70ml, stirs at room temperature, chitosan is evenly dispersed in triethylamine; Add it into the carbon tetrachloride solution to prepare the carbon tetrachloride solution of benzoyl chloride, wherein the addition amount of the photosensitive acyl chloride monomer is 2 times of the molar number of the amino group, imino group and hydroxyl group on the chitosan; Slowly add the carbon tetrachloride solution of the neutral acid chloride monomer into the chitosan solution dropwise, and keep stirring; after all the dropwise addition is completed, the reaction is continued for 4 hours, and after the reaction is completed, suction filtration is carried out to obtain a powdery solid. Then wash 3 times with 8wt% sodium bicarbonate, filter the washed product, and vacuum dry to obtain a photosensitive chitosan derivative with a degree of substitution of 1.6, whi...

Embodiment 3

[0040] 2g chitosan (degree of deacetylation DP=50%, weight average molecular weight Mw=100,000) is added in the triethylamine of 70ml, stirs at room temperature, chitosan is evenly dispersed in triethylamine; Add phenylsulfonyl chloride to carbon tetrachloride solution to prepare a carbon tetrachloride solution of p-methoxybenzenesulfonyl chloride, wherein the amount of photosensitive acyl chloride monomer is the amino group, imino group and hydroxyl group on chitosan 3 times the number of moles; slowly drop the carbon tetrachloride solution of the photosensitive acyl chloride monomer into the chitosan solution, and keep stirring; after all the drops are finished, continue to react for 6h, after the reaction is completed, carry out Suction filtration to obtain a powdery solid, then wash 3 times with 8wt% sodium bicarbonate, filter the washed product, and vacuum dry to obtain a photosensitive chitosan derivative with a degree of substitution of 2.3, which can be dissolved in ace...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention relates to a method for preparing organic-dissolvable photosensitive chitosan derivate. The method includes the following steps that: 2g of chitosan is added in 70ml of triethylamine, and is stirred under the room temperature, so that the chitosan can be uniformly dispersed in the triethylamine; carbon tetrachloride with 10 percent by weight of photosensitive acyl chloride monomer is prepared, wherein the amount of the added photosensitive acyl chloride monomer is 0.5 to 8 times larger than the mole number of amino group, imino group and hydroxyl group on the chitosan; the acyl chloride monomer solution is slowly dripped into the chitosan solution, and is constantly stirred; after all the acyl chloride monomer solution is dripped, reaction continuously takes place for 2 to 6 hours, vacuum filtration is carried out after the reaction is finished, so that powder-like solid is obtained, the powder-like solid is then washed by water with 8 percent by weight of sodium bicarbonate solution for three times, the product is filtered after washing, and is dried under vacuum, so that the chitosan derivate is obtained, and the chitosan derivate can be dissolved in organic solution such as acetone, methylbenzene, N,N-dimethylformamide and benzene. A non-toxic, harmless and pollution-free post-purification step is adopted in the preparation process, so the method is an environment-friendly technique.

Description

technical field [0001] The invention relates to a preparation method of an organic soluble photosensitive chitosan derivative. Background technique [0002] Chitin is the second largest renewable resource in natural products after cellulose. It is also the most important animal structure next to protein bone glue and the largest nitrogen-containing natural organic matter on the earth except protein. Chitosan (1,4-di-amino-2-deoxy-β-D-glucan) is the structural material of crustacean shell and is the N-deacetylation product of chitin. Generally speaking, N- Acetyl removed more than 55% can be called chitosan. Chitosan not only has the advantages of non-toxic, harmless, good biocompatibility, biodegradability, etc., but also has many excellent physiological properties such as anticancer, antibacterial, hemostatic, and enhancing human immunity. Therefore, chitosan has great application value in food, cosmetics, environmental protection, textile, printing and dyeing, papermakin...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
IPC IPC(8): C08B37/08
Inventor 马贵平聂俊吴浩蒋明燕崔荣
Owner HANGZHOU INST OF ADVANCED MATERIAL BEIJING UNIV OF CHEM TECH
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products