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Method for preparing butterfly lepidoptera-simulated hierarchical multi-layer symmetrical micro/nano structure

A micro-nano structure, asymmetric technology, applied in the direction of nano-structure manufacturing, micro-structure technology, micro-structure devices, etc., can solve the problems of expensive equipment, difficulty in preparing a complete structure, low efficiency, etc., and achieve the effect of low cost

Inactive Publication Date: 2010-09-08
HUAZHONG UNIV OF SCI & TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, its preparation method has always been difficult
For the preparation of hierarchical, multi-layer, asymmetric and micro-nano-scale biomimetic structures on the surface of butterfly phosphorous wings (scale changes range from tens of nanometers to hundreds of microns), it is difficult to prepare complete structures by conventional processes
The current research either directly uses biological templates combined with atomic layer deposition (ALD, Atomic Layer Deposition), or uses electron beam lithography, CVD (Chemical vapor deposition), FIB (Focused Ion Beam)-CVD processing, expensive equipment, The processing speed is slow, the efficiency is low, the cost is too high, and it is not suitable for mass production, thus limiting the research and development of related technologies

Method used

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  • Method for preparing butterfly lepidoptera-simulated hierarchical multi-layer symmetrical micro/nano structure
  • Method for preparing butterfly lepidoptera-simulated hierarchical multi-layer symmetrical micro/nano structure

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Embodiment Construction

[0018] The present invention will be further described below in conjunction with the accompanying drawings and specific embodiments.

[0019] The embodiment of the present invention is used to prepare the micro-nano structure imitating the surface of butterfly phosphorus wings, and the process flow is shown in figure 1 . Thermal growth of SiO on the surface of Si substrate 2 layer, using two photolithography and RIE dry etching, the two mask patterns are transferred to SiO 2 surface, and make the exposed silicon surface highly inconsistent, laying the foundation for the next step of asymmetric structure preparation. ICP deep etching is used to obtain a periodic / quasi-periodic micro-scale structure, and the side wall must retain sufficient corrugation depth during ICP etching. Then use electron beam oblique evaporation, plate a protective layer on the lower half of the corrugated side wall, and then perform lateral wet anisotropic etching to obtain a hierarchical, multi-laye...

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Abstract

The invention provides a method for preparing a butterfly lepidoptera-simulated hierarchical multi-layer symmetrical micro / nano structure, which comprise the following steps of: adopting a (111) monocrystalline silicon piece, and by adopting film growing, two-step photoetching, reaction ion dry etching and combining inductive couple plasma deep etching, obtaining a microscale structure of which the side wall is reserved with waves with enough depth and the waves of adjacent grooves are not symmetrical; performing electron beam inclined evaporation, and plating an Au / Cr protective layer on the lower half parts of the waves on the side wall; by combining a wet-method corrosion process, performing lateral anisotropic etching on the side wall of the microscale structure and controlling the etching time; and finally, obtaining the hierarchical layering period / standard period butterfly lepidoptera-simulated micro / nano structure with excellent characteristics. The method has the characteristics of high efficiency and low cost, is suitable for massive large-area production and is a new effective way for massive preparation and wide application of the butterfly lepidoptera-simulated surface micro / nano structure.

Description

Technical field: [0001] The invention belongs to the field of micro-nano processing, and in particular relates to a method for preparing a butterfly-like phosphorous wing micro-nano structure combining coating growth, photolithography, RIE dry etching, ICP deep etching, electron beam evaporation, and lateral wet etching. Background technique: [0002] The vast and rich nature is an inexhaustible source of human creation and invention, and bionics provides human beings with new ideas for scientific research. Among them, the dancing butterflies in nature provide a lot of inspiration for human beings to engage in scientific research. The little butterfly helps humans solve the problem of heat dissipation in artificial satellites. The research on the aerodynamic characteristics of butterfly flight is helpful for the bionic design of micro air vehicles. The viewing angle-dependent structural color change mechanism of butterfly wings leads to the fabrication of static elevator-s...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B81C1/00B82B3/00
Inventor 廖广兰彭争春史铁林高阳汪威
Owner HUAZHONG UNIV OF SCI & TECH
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