Method for preparing butterfly lepidoptera-simulated hierarchical multi-layer symmetrical micro/nano structure
A micro-nano structure, asymmetric technology, applied in the direction of nano-structure manufacturing, micro-structure technology, micro-structure devices, etc., can solve the problems of expensive equipment, difficulty in preparing a complete structure, low efficiency, etc., and achieve the effect of low cost
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment Construction
[0018] The present invention will be further described below in conjunction with the accompanying drawings and specific embodiments.
[0019] The embodiment of the present invention is used to prepare the micro-nano structure imitating the surface of butterfly phosphorus wings, and the process flow is shown in figure 1 . Thermal growth of SiO on the surface of Si substrate 2 layer, using two photolithography and RIE dry etching, the two mask patterns are transferred to SiO 2 surface, and make the exposed silicon surface highly inconsistent, laying the foundation for the next step of asymmetric structure preparation. ICP deep etching is used to obtain a periodic / quasi-periodic micro-scale structure, and the side wall must retain sufficient corrugation depth during ICP etching. Then use electron beam oblique evaporation, plate a protective layer on the lower half of the corrugated side wall, and then perform lateral wet anisotropic etching to obtain a hierarchical, multi-laye...
PUM
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com