Method for preparing butterfly lepidoptera-simulated hierarchical multi-layer symmetrical micro/nano structure
A micro-nano structure, asymmetric technology, applied in the direction of nano-structure manufacturing, micro-structure technology, micro-structure devices, etc., can solve the problems of expensive equipment, slow processing speed, unsuitable for mass production, etc., and achieve the effect of low cost
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[0018] The present invention will be further described below in conjunction with the accompanying drawings and specific embodiments.
[0019] The embodiment of the present invention is used to prepare the micro-nano structure imitating the surface of butterfly phosphorus wings, and the process flow is shown in figure 1 . Thermal growth of SiO on the surface of Si substrate 2 layer, using two photolithography and RIE dry etching, the two mask patterns are transferred to SiO 2 surface, and make the exposed silicon surface highly inconsistent, laying the foundation for the next step of asymmetric structure preparation. ICP deep etching is used to obtain a periodic / quasi-periodic micro-scale structure, and the side wall must retain sufficient corrugation depth during ICP etching. Then use electron beam oblique evaporation, plate a protective layer on the lower half of the corrugated side wall, and then perform lateral wet anisotropic etching to obtain a hierarchical, multi-laye...
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