Cleaning agent and cleaning method for electronic material

A technology of electronic materials and cleaning agents, applied in the direction of cleaning methods using liquids, cleaning methods and utensils, chemical instruments and methods, etc., can solve problems such as damaged substrate flatness, poor rinsing performance, and insufficient particle removal performance, and achieve improved Productivity, Effective High Cleaning, Excellent Particle Removal Effect

Inactive Publication Date: 2010-11-17
SANYO CHEM IND LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] However, there is a problem in that in the process of manufacturing glass or silicon substrates for flat panel displays, photomasks, hard disks, and semiconductors, the glass substrates are cut into suitable pieces as needed from the mother glass. Glass shavings (commonly called cullet) generated during sizing, organic dirt such as dust or processing oil scattered in the clean room, abrasives or abrasive dust used in the process of texturing the substrate surface, etc. adhere firmly to the substrate surface , cannot be sufficiently removed during the cleaning process
The former cleaning agent uses a nonionic surfactant to improve the particle removal performance. Since the surfactant component tends to remain on the surface of the electronic material, there are problems of poor rinsability and a decrease in productivity.
In addition, the latter type of cleaning agent contains sulfosuccinic acid-type anionic surfactants with an average carbon number of 10 to 20 for the purpose of improving permeability. Although the particle removal performance is improved, the foaming performance is very high. In addition, the defoaming property is insufficient, so there is a problem in handling (handling)
In addition, the cleaning agent proposed in Patent Document 3 is a cleaning agent in which hydrogen fluoride and ozone are dissolved, and it is expected to remove particles firmly attached to the surface of the substrate by etching. Controls strong etchability, and there is a problem of damaging the flatness of the substrate during cleaning
In addition, in the cleaning agent proposed in Patent Document 4, although the effect of preventing particle reattachment is improved to some extent by using an anionic surfactant, it has insufficient particle removal performance and cleaning performance because it has almost no etching property. insufficient problem

Method used

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  • Cleaning agent and cleaning method for electronic material
  • Cleaning agent and cleaning method for electronic material
  • Cleaning agent and cleaning method for electronic material

Examples

Experimental program
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Effect test

manufacture example 1

[0159] Add 256 parts of 2-ethylhexanol to a glass reaction device equipped with a stirring device and a temperature control device, cool to 0°C under stirring, keep the temperature in the system at 0°C, and add chlorosulfonic acid dropwise over 3 hours 229 parts to obtain sulfuric acid ester. Then slowly add 252 parts of 48% potassium hydroxide aqueous solution and 583 parts of ion-exchanged water, and mix for 60 minutes at 20° C. to neutralize to obtain 1248 parts of anionic surfactant (A-1) with an active ingredient concentration of 40%.

manufacture example 2

[0161] Add 148 parts of n-butanol to a glass reaction device with a stirring device and a temperature control device, adjust the temperature to 70°C under stirring, keep the temperature in the system at 70°C, and add 98 parts of phosphoric acid dropwise over 2 hours. , and then continue to stir at 70 ° C for 4 hours to obtain phosphoric acid ester. Then cool the system to 30°C, slowly add 133 parts of 30% sodium hydroxide aqueous solution and 201 parts of ion-exchanged water, mix at 20°C for 60 minutes for neutralization, and obtain an anionic surfactant with an active ingredient concentration of 40%. (A-2) 580 copies.

manufacture example 3

[0163] In addition to replacing 2-ethylhexanol with 3,7-dimethyl-1-octanol, 189 parts of chlorosulfonic acid, 253 parts of 48% potassium hydroxide aqueous solution with 271 parts of DBU, ion exchange The parts of water were replaced with 912 parts, and the others were the same as in Manufacturing Example 1 to obtain 1568 parts of anionic surfactant (A-3) whose active ingredient concentration was 40%.

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Abstract

Disclosed is a cleaning agent for electronic materials, which contains an anionic surfactant (A) having an anionic component represented by the general formula (1) below, and one or more organic solvents (B) selected from the group consisting of alkenes having 6-18 carbon atoms and organic solvents represented by the general formula (2) below. In this cleaning agent for electronic materials, the SP value of the component (B) is within the range of 6-13. R1[-(OA1)a-Q-]b (In the formula (1), R1 represents a hydrocarbon group having 1-10 carbon atoms; A1 represents an alkylene group having 2-4 carbon atoms; Q- represents -COO-, -OCH2COO-, -SO3 -, -OSO3 - or -OPO2(OR2)-; R2 represents a hydrogen or a hydrocarbon group having 1-10 carbon atoms; a represents an average that is a number of 0-20;b represents an integer of 1-6; and when Q- represents -COO- or -SO3 -, a is 0.) R3[-(OA2)c-OH]d (In the formula (2), R3 represents a hydrocarbon group having 1-12 carbon atoms; A2 represents an alkylene group having 2-4 carbon atoms; c represents an average that is a number of 0-20; and d represents an integer of 1-6).

Description

technical field [0001] The invention relates to a cleaning agent and a cleaning method for electronic materials. More specifically, it relates to a cleaning agent and a cleaning method suitable for substrates of flat panel displays, photomasks, hard disks, or semiconductors. Background technique [0002] In the cleaning technology of electronic materials, since impurities such as trace organic dirt, glass cullet, and sand particles remaining on the substrate during manufacturing have a great impact on the performance and yield of electronic materials, their treatment has become very important. In particular, impurities to be cleaned have become finer particles (particles), and are more likely to adhere and remain on the surface than ever before. Therefore, the establishment of advanced cleaning technology has become a top priority. Therefore, in order to prevent contamination by these fine particles, a method of improving particle removability using a surfactant has been pr...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B08B3/08C11D3/30C11D3/43H01L21/304B08B3/10B08B3/12C11D1/02C11D3/04
CPCC11D1/342C11D1/143C11D3/43C11D1/345C11D1/146C11D1/06C11D11/0047
Inventor 胜川吉隆铃木一充佐藤祥平
Owner SANYO CHEM IND LTD
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