Method for preparing electric-field directional solidification purified polysilicon
A technology of directional solidification and polysilicon, applied in chemical instruments and methods, silicon compounds, inorganic chemistry, etc., can solve the problems of increasing pollution sources, one more pollution, and ineffective removal of metal impurities, etc., to improve conversion efficiency and metal impurity content Reduced effect
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example 1
[0027] Example 1: First put 260kg of 4N pure silicon material in the graphite crucible 3, the total amount of metal impurities contained in it is 93ppmWt, P is 14.2ppmWt, and the whole system is closed; After multiple cleanings with pure argon, the silicon material is heated and melted under a vacuum state of 5 Pa; heat preservation is carried out through the furnace lining insulation layer 1 and the heater 2, and the temperature of the heater is controlled at 1550 ° C, and the control time is 7 hours to ensure that the silicon material has been completely Melting: After the silicon is completely melted, fill in an appropriate amount of argon gas, and at the same time use a vacuum pump to extract the argon gas inside the closed system, so that some volatile impurities will be released from the surface of the liquid silicon together with the argon gas. Obtain the height of the silicon liquid surface from the bottom of the crucible according to the liquid level detector, adjust t...
Embodiment 2
[0028]Embodiment 2: other conditions are the same as embodiment 1, put into the graphite crucible 3 and be that 255kg silicon material of 4N grade is put into, and its metal impurity total amount is 83ppmWt, and P is 12.8ppmWt. After vacuuming the whole system and filling it with high-purity argon gas through the gas filling hole 8 for several times, the vacuum state is below 3 Pa to heat and melt the silicon material; the temperature of the heater is controlled at 1580°C, and the control time is 6 hours to ensure that the silicon material has been All of them are melted; then an appropriate amount of argon gas is filled through the argon gas filling hole 8, and the argon gas inside the closed system is extracted by a vacuum pump at the same time. According to the liquid level height data obtained by the liquid level detector, adjust the negative electrode 9 of the electric field, so that the graphite with a diameter of 90 mm in the negative electrode of the electric field pene...
Embodiment 3
[0029] Embodiment 3: other conditions are the same as embodiment 1, put 250kg silicon material of 4N grade in the graphite crucible 3, its total metal impurity content is 67ppmWt, P is 9.48ppmWt. The vacuum state is below 2Pa to heat and melt the silicon material; the temperature of the heater is controlled at 1580°C, and the control time is 5.5 hours to ensure that the silicon material has been completely melted; then fill in an appropriate amount of argon, and at the same time use a vacuum pump to extract the argon gas inside the closed system . Adjust the electric field negative electrode 9, so that the graphite with a diameter of 90mm in the electric field negative electrode penetrates into the silicon liquid 20mm; the energized current is controlled at 450A, and after the electric field is applied for 3 hours, the directional solidification starts from the bottom and gradually goes upward until the silicon liquid is completely solidified, from the bottom to the top The av...
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