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Method for preparing electric-field directional solidification purified polysilicon

A technology of directional solidification and polysilicon, applied in chemical instruments and methods, silicon compounds, inorganic chemistry, etc., can solve the problems of increasing pollution sources, one more pollution, and ineffective removal of metal impurities, etc., to improve conversion efficiency and metal impurity content Reduced effect

Inactive Publication Date: 2010-12-01
高向瞳
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The pickling method can remove some active metals, but pickling adds new sources of pollution, and one more process means one more possibility of pollution
Directional solidification is to put the silicon material into the crucible, and under the protection of vacuum or inert gas atmosphere, the silicon material is completely melted by electric heating, and then the temperature is gradually lowered from the bottom to the top, so that the entire silicon liquid will form from the bottom to the top. A certain temperature gradient, so that the silicon liquid will gradually solidify from the bottom to the top, and finally most of the metal impurities with low segregation coefficients will be repelled to the surface of the silicon ingot to be removed, but the removal effect of some metal impurities with large segregation coefficients is not obvious , the existence of this part of metal impurities will reduce the conversion efficiency of polycrystalline silicon solar cells, this problem needs to be solved

Method used

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  • Method for preparing electric-field directional solidification purified polysilicon
  • Method for preparing electric-field directional solidification purified polysilicon

Examples

Experimental program
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Effect test

example 1

[0027] Example 1: First put 260kg of 4N pure silicon material in the graphite crucible 3, the total amount of metal impurities contained in it is 93ppmWt, P is 14.2ppmWt, and the whole system is closed; After multiple cleanings with pure argon, the silicon material is heated and melted under a vacuum state of 5 Pa; heat preservation is carried out through the furnace lining insulation layer 1 and the heater 2, and the temperature of the heater is controlled at 1550 ° C, and the control time is 7 hours to ensure that the silicon material has been completely Melting: After the silicon is completely melted, fill in an appropriate amount of argon gas, and at the same time use a vacuum pump to extract the argon gas inside the closed system, so that some volatile impurities will be released from the surface of the liquid silicon together with the argon gas. Obtain the height of the silicon liquid surface from the bottom of the crucible according to the liquid level detector, adjust t...

Embodiment 2

[0028]Embodiment 2: other conditions are the same as embodiment 1, put into the graphite crucible 3 and be that 255kg silicon material of 4N grade is put into, and its metal impurity total amount is 83ppmWt, and P is 12.8ppmWt. After vacuuming the whole system and filling it with high-purity argon gas through the gas filling hole 8 for several times, the vacuum state is below 3 Pa to heat and melt the silicon material; the temperature of the heater is controlled at 1580°C, and the control time is 6 hours to ensure that the silicon material has been All of them are melted; then an appropriate amount of argon gas is filled through the argon gas filling hole 8, and the argon gas inside the closed system is extracted by a vacuum pump at the same time. According to the liquid level height data obtained by the liquid level detector, adjust the negative electrode 9 of the electric field, so that the graphite with a diameter of 90 mm in the negative electrode of the electric field pene...

Embodiment 3

[0029] Embodiment 3: other conditions are the same as embodiment 1, put 250kg silicon material of 4N grade in the graphite crucible 3, its total metal impurity content is 67ppmWt, P is 9.48ppmWt. The vacuum state is below 2Pa to heat and melt the silicon material; the temperature of the heater is controlled at 1580°C, and the control time is 5.5 hours to ensure that the silicon material has been completely melted; then fill in an appropriate amount of argon, and at the same time use a vacuum pump to extract the argon gas inside the closed system . Adjust the electric field negative electrode 9, so that the graphite with a diameter of 90mm in the electric field negative electrode penetrates into the silicon liquid 20mm; the energized current is controlled at 450A, and after the electric field is applied for 3 hours, the directional solidification starts from the bottom and gradually goes upward until the silicon liquid is completely solidified, from the bottom to the top The av...

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Abstract

The invention relates to a method for preparing electric-field directional solidification purified polysilicon. The method comprises the following steps of: adding a silicon material into a graphite crucible of a sealed purifying furnace, purifying the sealed purifying furnace, heating and melting the silicon material in the graphite crucible of the sealed purifying furnace by a heater, completely melting the silicon material and preserving heat; applying an electric field to the completely molten silicon material in the graphite crucible and continuing to preserving heat by the heater for 2-6 hours while acting by the electric field; cooling through the bottom of the graphite crucible to ensure that the silicon material is solidified from the bottom to the top, quickly cooling an obtained silicon ingot after the silicon material is completely solidified, and annealing at 1,350-1,380 DEG C; and taking the silicon ingot out of the furnace, finishing to remove the head and the tail to finish purifying so as to obtain high-purity polysilicon. Compared with the prior art, in the invention, directional solidification is carried out through applying the electric field, which ensures that metal impurities are aggregated to the surface of liquid silicon under the action of the electric field, and most metal impurities are solidified to the surface of the silicon ingot through the directional solidification from the bottom to the top; and finally, the head and the tail of the silicon ingot are removed to obtain the polysilicon with higher purify, thereby the conversion efficiency of a solar battery is improved.

Description

Technical field: [0001] The invention relates to the technical field of silicon and its compounds, in particular to a method for preparing polysilicon by electric field directional solidification and purification. Background technique: [0002] The common problem faced by the purification of solar-grade silicon materials by physical metallurgy is how to purposefully and selectively remove the inherent impurities brought about by the metallurgical method itself. Metal impurities in silicon belong to deep-level impurities, even multiple-level impurities and double deep-level impurities that are donors and acceptors at the same time. The reduction in the effective lifetime of minority carriers in silicon caused by a very small amount of metal impurities will greatly reduce the photoelectric conversion efficiency of the cell. In order to remove metal impurities, the technologies currently used by various scientific research institutions and enterprises are pickling or direction...

Claims

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Application Information

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IPC IPC(8): C01B33/037
Inventor 高向瞳赵百通
Owner 高向瞳
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