Cleaning liquid for solar polycrystalline silicon wafer
A technology for polycrystalline silicon wafers and cleaning solution, which is applied in detergent compounding agents, detergent compositions, organic cleaning compositions, etc., can solve problems such as affecting the yield and product quality, solar wafers fluffing, white spots, and inability to clean them. , to achieve the effect of improving yield and quality, reducing enterprise costs and increasing cleanliness
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Embodiment 1
[0031] Raw materials and weight percentages are as follows:
[0032] Isopropanol 30%
[0033] Fatty alcohol polyoxyethylene polyoxypropylene ether L64 (American BASF product model) 3%
[0035] Disodium EDTA 2%
[0036] Polyethylene glycol 2%
[0037] 60% pure water.
[0038] Place silicon wafers with black spots or black spots in a flower basket, soak them in an ultrasonic cleaning tank filled with the cleaning solution of the present invention, ultrasonically clean them at 50-70°C for 5-10 minutes, and then dry them after several times of ultrasonic rinsing with pure water. That's it.
Embodiment 2
[0040] Raw materials and weight percentages are as follows:
[0041] Ethylene Glycol 25%, Propylene Glycol 15%
[0042] Fatty alcohol polyoxyethylene polyoxypropylene ether LF431 (American BASF product model) 2%
[0043] Potassium Carbonate 2%, Sodium Bicarbonate 1%
[0044] Sodium Nitrilotriacetate 1.7%, Ammonium Salt 1.3%
[0045] Sodium Polyacrylate 0.2%, Polyethylene Glycol 0.3%
[0046] Pure water 51.5%.
[0047] Place silicon wafers with black spots or black spots in a flower basket, soak them in an ultrasonic cleaning tank filled with the cleaning solution of the present invention, ultrasonically clean them at 50-70°C for 5-10 minutes, and then dry them after several times of ultrasonic rinsing with pure water. That's it.
Embodiment 3
[0049] Raw materials and weight percentages are as follows:
[0050] n-butanol 20%, isobutanol 10% monomethyl glycol 10%
[0051] Fatty alcohol polyoxyethylene polyoxypropylene ether LF431 (American BASF product model) 5%
[0052] Sodium Carbonate 2%, Potassium Bicarbonate 1%, Sodium Metasilicate 1%
[0053] Diaminetetraacetic acid 1%, diethylenetriaminepentaacetic acid 1%, sodium salt 1%
[0054] Styrene block copolymer 0.7%, polyacrylic acid 0.8%, polyethyleneimine 0.5%
[0055] Pure water 46%.
[0056] Place silicon wafers with black spots or black spots in a flower basket, soak them in an ultrasonic cleaning tank filled with the cleaning solution of the present invention, ultrasonically clean them at 50-70°C for 5-10 minutes, and then dry them after several times of ultrasonic rinsing with pure water. That's it.
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