Low-melting-point and little-scum hot dipping auxiliary plating agent
A kind of flux, hot dip plating technology, applied in the field of flux without ammonia salt, less dross, low melting point, and flux, it can solve the lag of solid/liquid interface reaction, delay of slag floating time, The problems such as the leakage plating surface of the plated parts can reduce the leakage plating rate, reduce the amount of dross and improve the wettability.
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Examples
Embodiment 1
[0023] In 1000 L of tap water, add 80 kg of zinc chloride, 10 kg of sodium chloride, 5 kg of sodium fluoride, 20 kg of sodium dihydrogen phosphate, 0.9 kg of perfluorooctanesulfonyl quaternary iodide, and 1.1 kg of polyoxyethylene fatty acid ester kg, fully stirred evenly, to obtain a hot-dip plating flux with low melting point, less scum, and no ammonium salt.
Embodiment 2
[0025] In 1000 L tap water, add 140 kg of zinc chloride, 30 kg of sodium chloride, 15 kg of sodium fluoride, 80 kg of zinc dihydrogen phosphate, 2 kg of fatty acid polyoxyethylene ester, N-ethyl, N-hydroxyethyl Perfluorooctane sulfonamide 1 kg, fully stirred evenly, to obtain a hot-dip plating flux with low melting point, less scum, and no ammonium salt.
Embodiment 3
[0027] In 1000 L of tap water, add 100 kg of zinc chloride, 20 kg of sodium chloride, 10 kg of sodium fluoride, 30 kg of sodium dihydrogen phosphate, 30 kg of zinc dihydrogen phosphate, and 0.5 kg of perfluorooctanesulfonyl quaternary iodide , fatty acid polyoxyethylene ester 0.5 kg, N-ethyl, N-hydroxyethyl perfluorooctane sulfonamide 1kg, fully stirred evenly, to obtain a hot-dip plating flux with low melting point, less scum, and no ammonium salt.
PUM
Property | Measurement | Unit |
---|---|---|
melting point | aaaaa | aaaaa |
thickness | aaaaa | aaaaa |
thickness | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com