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Bimetallic sensitive layer-based laser direct-writing grayscale mask manufacturing method

A gray-scale mask and laser direct writing technology, which is applied to the photoplate making process, optics, and diffraction grating of the patterned surface, can solve the problems of high cost, long production cycle, and difficulty in mass production, and achieve easy operation and high efficiency. Good production accuracy and repeatability

Inactive Publication Date: 2011-05-04
NO 510 INST THE FIFTH RES INST OFCHINA AEROSPAE SCI & TECH
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  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0002] In the development process of diffractive optical element manufacturing technology, due to the disadvantages of high cost, long production cycle, and difficult mass production of binary optical elements using standard binary optical element manufacturing methods and direct writing technology, in recent years, researchers have explored some Low-cost, short-period manufacturing method of diffractive optical element

Method used

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Embodiment Construction

[0011] Preferred embodiments of the present invention are described below.

[0012] This embodiment is carried out by using CLWS-300C / M polar coordinate laser direct writing equipment and CMS-18 magnetron sputtering equipment.

[0013] (1) Production of the metal-sensitive layer: use quartz glass with a diameter of 25mm as the substrate, and use RF magnetron sputtering equipment to coat Zn / Al metal thin film on its surface. The coating process parameters: sputtering power 100W, DC bias 500V, The sputtering pressure is 3mtorr, and the total thickness of the metal thin film sensitive layer is 150nm, of which the thickness of the Zn film is 140nm, and the thickness of the Al film is 10nm;

[0014] (2) The design of the exposure control program of the gray scale mask: according to the designed diffraction microstructure information of the binary optical element, the computer programming is used to convert the design data of the binary optical element into the control program of th...

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Abstract

The invention relates to a bimetallic sensitive layer grayscale mask manufacturing method used for batch production of binary optical elements, which comprises the following three steps of: manufacturing a bimetallic sensitive layer, designing a grayscale mask exposure control program, and performing laser exposure, namely plating a bimetallic film on the surface of a mask substrate to form the bimetallic sensitive layer; and exposing the bimetallic sensitive layer by adopting a laser direct-writing method according to sensitive characteristic of transmissivity of the bimetallic sensitive layer relative to laser intensity so as to form a grayscale mask of which the transmissivity is matched with diffraction microstructure design information of a binary optical element, wherein the grayscale mask comprises phase information of a plurality of binary optical elements, and the needed binary optical element is obtained through primary photoetching process and etching. Because the grayscale mask can be repeatedly used, the grayscale mask can be used for batch production of the binary optical elements.

Description

technical field [0001] The invention relates to a manufacturing technology of a diffractive optical element mask, in particular to a batch manufacturing method of a laser direct writing greyscale mask of a diffractive optical element based on a metal sensitive layer. Background technique [0002] In the development process of diffractive optical element manufacturing technology, due to the disadvantages of high cost, long production cycle, and difficult mass production of binary optical elements using standard binary optical element manufacturing methods and direct writing technology, in recent years, researchers have explored some A low-cost, short-period manufacturing method for a diffractive optical element. Contents of the invention [0003] The purpose of the present invention is to address the deficiencies in the prior art and provide a method for making a laser direct writing gray scale mask based on a dual metal sensitive layer. It uses the laser direct writing met...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G02B5/18G03F7/00
Inventor 王多书陈焘叶自煜马锋王济洲刘宏开
Owner NO 510 INST THE FIFTH RES INST OFCHINA AEROSPAE SCI & TECH
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