Bimetallic sensitive layer-based laser direct-writing grayscale mask manufacturing method
A gray-scale mask and laser direct writing technology, which is applied to the photoplate making process, optics, and diffraction grating of the patterned surface, can solve the problems of high cost, long production cycle, and difficulty in mass production, and achieve easy operation and high efficiency. Good production accuracy and repeatability
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[0011] Preferred embodiments of the present invention are described below.
[0012] This embodiment is carried out by using CLWS-300C / M polar coordinate laser direct writing equipment and CMS-18 magnetron sputtering equipment.
[0013] (1) Production of the metal-sensitive layer: use quartz glass with a diameter of 25mm as the substrate, and use RF magnetron sputtering equipment to coat Zn / Al metal thin film on its surface. The coating process parameters: sputtering power 100W, DC bias 500V, The sputtering pressure is 3mtorr, and the total thickness of the metal thin film sensitive layer is 150nm, of which the thickness of the Zn film is 140nm, and the thickness of the Al film is 10nm;
[0014] (2) The design of the exposure control program of the gray scale mask: according to the designed diffraction microstructure information of the binary optical element, the computer programming is used to convert the design data of the binary optical element into the control program of th...
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