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Positive radiation-sensitive resin composition, and interlayer insulating film and method for forming the same

A radiation and sensitivity technology, applied in optics, opto-mechanical equipment, instruments, etc., can solve problems such as difficulty in adapting to the size of substrates, inability to adapt to large-scale substrate coating, etc., achieving good coating properties and shortening drying steps.

Inactive Publication Date: 2011-05-04
JSR CORPORATIOON
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] When the substrate size is small, such as the second-generation size or less, it can be coated by the spin coating method, but in this method, a large amount of radiation-sensitive resin composition solution is required for coating, and further enlargement cannot be accommodated. Substrate coating
In addition, when the substrate size is below the fourth generation size, it is coated by the slit and spin coating method, but it is difficult to adapt to the fifth generation and later substrate sizes

Method used

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  • Positive radiation-sensitive resin composition, and interlayer insulating film and method for forming the same
  • Positive radiation-sensitive resin composition, and interlayer insulating film and method for forming the same
  • Positive radiation-sensitive resin composition, and interlayer insulating film and method for forming the same

Examples

Experimental program
Comparison scheme
Effect test

Synthetic example 1

[0179] In a container with a stirrer, add 25 parts by mass of propylene glycol monomethyl ether, then add 30 parts by mass of methyltrimethoxysilane, 23 parts by mass of phenyltrimethoxysilane, and 0.1 parts by mass of tetraisopropoxy aluminum, Heating was carried out so that the temperature of the solution reached 60°C. After the solution temperature reached 60°C, 18 parts by mass of ion-exchanged water was added, heated to 75°C, and kept for 3 hours. Next, 28 parts by mass of methyl orthoformate was added as a dehydrating agent, and stirred for 1 hour. Further control the temperature of the solution at 40°C, and evaporate while maintaining the temperature to remove the ion-exchanged water and methanol produced by hydrolysis and condensation. Thus, a hydrolysis-condensation product (A-1) was obtained. The solid content concentration of the hydrolytic condensate (A-1) was 40.5% by mass, the number average molecular weight (Mn) of the obtained hydrolytic condensate was 1,500,...

Synthetic example 2

[0181] In a container with a stirrer, add 25 parts by mass of propylene glycol monomethyl ether, then add 18 parts by mass of methyltrimethoxysilane, 15 parts by mass of tetraethoxysilane, 20 parts by mass of phenyltrimethoxysilane and 0.5 parts by mass of oxalic acid was used in the same manner as in Synthesis Example 1 to obtain a hydrolysis-condensation product (A-2). The solid content concentration of the hydrolytic condensate (A-2) was 40.8% by mass, the number average molecular weight (Mn) of the obtained hydrolytic condensate was 1,200, and the molecular weight distribution (Mw / Mn) was 2.

Synthetic example 3

[0183] In a container with a stirrer, add 25 parts by mass of propylene glycol monomethyl ether, then add 22 parts by mass of methyltrimethoxysilane, 12 parts by mass of γ-glycidoxypropyl trimethoxysilane, 20 parts by mass Parts of phenyltrimethoxysilane and 0.1 parts by mass of tetraisopropoxyaluminum were used in the same manner as in Synthesis Example 1 to obtain a hydrolysis condensate (A-3). The solid content concentration of the hydrolytic condensate (A-3) was 39.8% by mass, the number average molecular weight (Mn) of the obtained hydrolytic condensate was 1,600, and the molecular weight distribution (Mw / Mn) was 2.

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Abstract

The present invention relates to a positive radiation-sensitive composition, an interlayer insulating film and a method for forming the same. The aim of the invention is to provide a positive radiation-sensitive resin composition which can represent excellent coating performance and film thickness uniformity, shortens the drying time of the coated film and has high radiation ray sensitivity when a slit coating method is used as a coating method. The positive radiation-sensitive resin composition of the invention comprises the following components: (A) a siloxane polymer, (B) a chinone diazido compound and (C) a solvent represented by a formula (1). In the formula (1), R1 and R2 respectively represent a straight-chain or branch-chain alkyl with 1-6 carbon atoms. When the number of carbon atoms in a random one member selected from R1 and R2 is 1-4, the number of carbon atoms in the other member is 5 or 6. A general formula of R1-O-R2 (1) is represented as follows.

Description

technical field [0001] The present invention relates to a positive radiation-sensitive composition suitable for use as a material for forming an interlayer insulating film of a display element such as a liquid crystal display element (LCD), an interlayer insulating film formed from the composition, and the interlayer insulating film Membrane Formation Method. Background technique [0002] Generally, in a liquid crystal display element or the like, an interlayer insulating film is provided in order to insulate wirings arranged in layers. As a material for forming an interlayer insulating film, a radiation-sensitive composition is being widely used because a preferable composition can obtain a necessary pattern shape in fewer steps and has sufficient flatness. [0003] In addition, interlayer insulating films such as liquid crystal display elements must be patterned with contact holes for wiring. Since it is difficult to form a contact hole having a pore diameter at a practi...

Claims

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Application Information

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IPC IPC(8): G03F7/075G03F7/00
CPCG03F7/0223G03F7/0395G03F7/075H01L21/0273H01L21/0274
Inventor 一户大吾花村政晓
Owner JSR CORPORATIOON
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