Anti-charged dust device used on surface of optical system or solar cell
A technology of solar cells and optical systems, applied in photovoltaic power generation, circuits, electrical components, etc., can solve the problems of optical system image quality impact, limit the application of dust removal electric curtains, etc., achieve good dust prevention and dust removal effects, good hydrophobicity and natural Cleaning function, effect of increased roughness
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[0024] Example 1
[0025] Such as figure 1 As shown, a device for preventing charged dust on the surface of a solar cell is composed of a substrate 1, and an indium tin oxide layer 2, a titanium dioxide nanoparticle array layer 3, and a fluoropolymer film layer sequentially formed on the substrate 1. 4 constitute.
[0026] Among them, the substrate 1 is a p-type single crystal silicon wafer used on the surface of the solar cell; the indium tin oxide layer 2 is a transparent indium tin oxide layer; the titanium dioxide particle size in the titanium dioxide nanoparticle array layer 3 is 5 microns, The achievable roughness of the titanium dioxide nanoparticle array layer is 2; the fluoropolymer film layer 4 is a polytetrafluoroethylene layer with a thickness of 5 microns.
[0027] Such as figure 2 As shown, under ultraviolet light, the conduction band energy level of titanium dioxide in the titanium dioxide nanoparticle array layer 3 is -4.21 eV, and the conduction band energy level ...
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[0028] Example 2
[0029] A device for preventing charged dust on the surface of an optical system is composed of a substrate 1, and an indium tin oxide layer 2, a titanium dioxide nanoparticle array layer 3, and a fluoropolymer film layer 4 sequentially formed on the substrate 1.
[0030] Among them, the substrate 1 is K9 glass used on the surface of the optical system; the indium tin oxide layer 2 is a transparent indium tin oxide layer; the particle size of the titanium dioxide in the titanium dioxide nanoparticle array layer 3 is 50 nm, and the size of the titanium dioxide particle array layer is The roughness is 2; the fluoropolymer film layer 4 is a polyvinylidene fluoride layer with a thickness of less than 100 nm.
[0031] The mechanism is the same as that in Example 1, but the tolerance temperature range of polyvinylidene fluoride and polytetrafluoroethylene in the fluoropolymer layer is different. The tolerance temperature of polytetrafluoroethylene is -196~260℃. The toler...
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