Method for manufacturing anti-bacterial cloth through vacuum ion anchoring technology
An antibacterial cloth and anchoring technology, which is applied in the field of vacuum ion anchoring technology to manufacture antibacterial cloth, can solve the problems of single type of antibacterial agent, unsatisfactory antibacterial effect, and decreased antibacterial effect, so as to achieve good antibacterial effect, inhibit the reproduction of harmful bacteria, low cost effect
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Embodiment 1
[0035] 1) Pre-treat the surface of the fabric, wash it with an organic solvent and deionized water in sequence under ultrasonic conditions, the cleaning time is 10 minutes, and finally dry it at 25°C for 1 hour under vacuum conditions. The organic solvent is acetone and ethanol mixture;
[0036] 2) Fill the container with titanium target, silver target and germanium target with argon, and use vacuum equipment to reduce the pressure in the container to a vacuum degree of 10 -2 torr, oxygen is introduced, the pressure in the container is controlled to 2 mtorr, and the temperature is 50°C. Direct current is passed through the titanium target, silver target and germanium target to generate plasma discharge. The voltage of the direct current: 300V, the current density: 6mA / cm 2 , power density: 5W / cm 2 ;
[0037] 3) Pass the cloth through the titanium target, silver target and germanium target at a uniform speed in a retracted manner, so that the three metal ions are anchored in...
Embodiment 2
[0041] Repeating Example 1 is just that the pretreatment of the cloth uses electrophoresis to remove the cloth surface pollutants; the pressure in the container drops to a vacuum degree of 10 -3 torr, oxygen is introduced, the pressure in the container is controlled to 4 mtorr, the temperature is 80°C, the voltage of the direct current: 500V, the current density: 10mA / cm 2 , power density: 10W / cm 2 In addition, a magnetic field parallel to the surface of the titanium target, silver target and germanium target source is set in the container, and the magnetic field strength is 50Gs; the maximum deposition rate of the titanium target, silver target and germanium target is 200nm / min.
Embodiment 3
[0043] Repeat Example 1 only to set a magnetic field parallel to the surface of the titanium target, silver target and germanium target source in the container, and the pressure in the container drops to a vacuum degree of 10 -5 torr, feed oxygen, control the pressure in the container to 10 mtorr, the temperature to 250°C, the voltage of the direct current: 800V, the current density: 60mA / cm 2 , power density: 40W / cm 2 , the magnetic field strength is 280Gs; the maximum deposition rate of titanium target, silver target and germanium target is 1000nm / min.
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