Eureka AIR delivers breakthrough ideas for toughest innovation challenges, trusted by R&D personnel around the world.

Method for manufacturing color filter, color filter substrate and color filter

A technology for a color filter substrate and a manufacturing method, which is applied to the photoplate-making process, instruments, optical filters, etc. The effect of uniform film thickness

Inactive Publication Date: 2011-07-06
DAINICHISEIKA COLOR & CHEM MFG CO LTD
View PDF0 Cites 8 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0010] The object of the present invention is to solve problems such as complicated steps and shortening of working time in the manufacture of a color filter having excellent performance in image characteristics such as pixel fineness and sharpness, thereby providing an easy and economical manufacture capable of handling Method for Upsizing and Miniaturizing Color Filters of Liquid Crystal Displays

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Method for manufacturing color filter, color filter substrate and color filter
  • Method for manufacturing color filter, color filter substrate and color filter
  • Method for manufacturing color filter, color filter substrate and color filter

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0072] Example 1 (Preparation of a color filter substrate having partition walls formed on a metallic chromium black matrix)

[0073] A glass substrate for color filters on which a low-reflection chrome-based black matrix was formed was prepared. The width of the black matrix is ​​20 μm, the length of the opening for forming a pixel is 280 μm, and the width is 80 μm. On the surface of the glass substrate on which the black matrix was formed, a positive resist was applied with a coater so that the thickness after drying was 8 μm, and air drying was performed at 50° C. or lower.

[0074] UV exposure was performed from the backside of the glass substrate coated with positive resist. Next, it was developed with a 3% trisodium phosphate aqueous solution, washed with water, neutralized with a 1% aqueous solution of phosphoric acid, washed with water, and dried. The height of the barrier rib formed from the positive resist layer formed on the black matrix was 8 μm. A color filter ...

Embodiment 2

[0076] Example 2 (Preparation of a color filter substrate having partition walls formed on a black resin type black matrix)

[0077] A glass substrate for color filters on which a black resin type black matrix was formed was prepared. The black matrix has a thickness of about 2 μm and a width of 20 μm, and the openings for forming pixels are 280 μm long and 80 μm wide. In the same manner as in Example 1, the same positive-type resist used in Example 1 was applied to the surface of the glass substrate on which the black matrix was formed with a coater so that the thickness after drying became 6 μm, and the process was carried out at 50° C. or lower. Air dry. UV exposure was performed from the backside of the glass substrate coated with positive resist. Next, it was developed with a 3% trisodium phosphate aqueous solution, washed with water, neutralized with a 1% aqueous solution of phosphoric acid, washed with water, and dried. The height of the barrier ribs formed of the po...

Embodiment 3

[0078] Example 3 (manufacture of color filter by ultraviolet curable inkjet printing method)

[0079] (a) Miniaturization treatment using pigment

[0080] As the pigment used, prepare PR254 (red pigment-1), PR177 (red pigment-2), PG36 (green pigment-1), PY139 (yellow pigment-1), PY138 (yellow pigment-2), PY150 (yellow pigment Pigment-3), PB15:6 (blue pigment-1) and PV23 (purple pigment-1), these pigments were micronized with crushed table salt. According to the conventional method, each pigment was loaded into a kneader equipped with a pressure cover at a mass ratio of 1.7:1.3 with ground salt and diethylene glycol, kneaded for 7 hours, and ground. The obtained ground material was poured into water, stirred to dissolve common salt and diethylene glycol, filtered and washed with water, and each pigment press cake was obtained. The pigment component in each pigment press cake is 35-45%. In addition, the average particle diameter of the pigment is about 30-40 nm.

[0081] (b)...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
viscosityaaaaaaaaaa
particle sizeaaaaaaaaaa
thicknessaaaaaaaaaa
Login to View More

Abstract

Disclosed is a method for manufacturing a CF, comprising a step for coating a photo-degradation type positive resist to cover at least black matrices formed on a surface of a color filter substrate, thereby forming a resist layer; a step for exposing the resist layer from the rear surface of the CF substrate; a step for washing and removing the resist layer melted by the exposure to form hole spaces or groove spaces (empty holes) separated by holed walls (groove walls, separation walls) made of the resist layer remaining on the BM; a step for providing the hole spaces with colored inks corresponding to pixels of the CF to form colored films; and a step for exposing from the BM side to melt and remove the separate walls made of the resist layer. The method can solve problems with respect to complicated processes, shortening of operation time, and so on in manufacturing of a CF having excellent performances in image properties, such as fine resolution of pixels and sharpness, thereby easily and economically providing a method for manufacturing a CF that can cope with either a large-size or miniaturized liquid crystal display.

Description

technical field [0001] The present invention relates to a manufacturing method of a color filter (hereinafter sometimes abbreviated as "CF"), a color filter, and an image display device using the color filter. More specifically, it relates to a black matrix formed on a color filter substrate. (hereinafter sometimes abbreviated as "BM"), a method of manufacturing a color filter in which colored pixels of each color are formed in gaps between walls, a color filter substrate formed by the above method, a color filter formed using the color filter substrate, and An image display device using the color filter. Background technique [0002] With the recent great development of information equipment, liquid crystal color displays are used as information display components for personal computers, mobile information equipment, televisions, projectors, monitors, car navigation systems, mobile phones, electronic computers and electronic dictionaries. Screens, information bulletin boar...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): G02B5/20C09D11/00C09D11/10G02F1/1335G03F7/023C09D11/322C09D11/326C09D11/38
CPCG03F7/105G03F7/022C09D11/322C09D11/037G02B5/201G03F7/0007G02F1/133516G02B5/20G02F1/1335
Inventor 中村道卫幸正弘原田修江木慎一郎坂井尚之山口俊夫
Owner DAINICHISEIKA COLOR & CHEM MFG CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com