Preparation method for small silicon-based nano hollow array with orderly heights
A highly ordered, small-scale technology, used in the manufacture of microstructure devices, processes for producing decorative surface effects, decorative arts, etc. Easy operation control, highly ordered arrangement, low equipment price and low production cost
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[0027] 1. The substrate is Si(001) single wafer. Carry out the following cleaning treatment: rinse with deionized water for 2 minutes, sonicate with acetone for 5 minutes, and sonicate with methanol for 5 minutes. Rinse with deionized water for 5 minutes. in H 2 SO 4 :H 2 o 2 =2:1 After boiling the solution for 5 minutes, continue to soak for 5 minutes. After rinsing with deionized water for 3 minutes, put the ratio of HF:H 2 Dip in O=1:9 solution for 60 seconds to remove the oxide layer on the surface of the silicon wafer. Finally, after rinsing with deionized water for 60 seconds, spin dry with a spinner.
[0028] 2. To cover a single layer of polystyrene nanospheres on a silicon substrate, establish as figure 2 installation. The petri dish is made of polystyrene. The size is 100mm×20mm.
[0029] 3. will figure 2The slides used in the shown device were cleaned as follows: rinse with deionized water for 2 minutes, sonicate with acetone for 5 minutes, sonicate with...
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