Monocrystalline silicon wafer etching auxiliary, as well as preparation and using method thereof

Abstract

The invention relates to a monocrystalline silicon wafer etching auxiliary for a solar cell, an alkaline etching agent containing the etching auxiliary, and an etching method of a monocrystalline silicon wafer for the solar cell by using the etching auxiliary or the alkaline etching agent. When the monocrystalline silicon wafer for the solar cell is subjected to surface etching, the etching auxiliary in the invention is added into alkaline solution, and is not required to be refilled massively in an etching process, so that an excellent etching effect is achieved. The etching auxiliary has no toxicity, no corrosion, no irritation, no combustion or explosion hazard, and is harmless to human bodies and environment; and the preparation and using process of the etching agent is simple, the equipment has low cost, and the repeatability is good.

Description

technical field [0001] The invention relates to a monocrystalline silicon wafer texturing auxiliary for solar cells, an alkaline texturing agent containing the texturing auxiliary, and the use of the texturing auxiliary or alkaline texturing agent for monocrystalline silicon wafers for solar cells The method of making velvet. Background technique [0002] In the process of preparing solar cells, in order to improve the performance and efficiency of solar cells, it is necessary to make a textured surface on the surface of the silicon wafer. The effective textured structure can make the incident sunlight reflect and refract multiple times on the surface of the silicon wafer, changing the incident light. The way forward in silicon. On the one hand, the optical path is extended, thereby increasing the absorption rate of infrared light by the silicon wafer; on the other hand, more photons are absorbed in the area near the pn junction to generate photo-generated carriers, and the...

AI Technical Summary

Problems solved by technology

However, including these two invention patents, the texturizing liquid used in the current production all contains isopropanol or ethanol, thereby causing the following two main problems: (1) the boiling point of isopropanol and ethanol is low , is volatile, so it needs to be added frequently, the production cost is high, and it is inconvenient for the operation; (2) the amount of isopropanol or ethanol is too large, so that the chemical oxygen demand value of the raffinate after texturing seriously exceeds the standard, resulting in a large amount of Environmental pollution and waste liquid treatment costs

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