Texturing additive for monocrystalline silicon surface treatment, texturing agent and monocrystalline silicon surface texturing method

Abstract

The invention relates to the technical field of monocrystalline silicon wafer texturing agents. The invention discloses a texturing additive for monocrystalline silicon surface treatment. The texturing additive is prepared from the following components in percentage by weight: 0.01 to 1.0 percent of sodium lignin sulfonate, 0.0001 to 0.01 percent of sodium polynaphthaldehyde sulfonate, 0.2 to 4 percent of polyethylene glycol, 1.5 to 5 percent of diethylene glycol butyl ether, 1.5 to 2.5 percent of potassium perfluorohexylsulfonate, 0.1 to 5 percent of sodium diethylcaprylate and 82 to 96 percent of water. The invention further discloses a texturing agent for monocrystalline silicon surface treatment, the texturing additive is added into a 1%-2% sodium hydroxide or potassium hydroxide solution, the mixture is mixed to be uniform at the temperature of 20-80 DEG C, and the mass ratio of the texturing additive to the alkaline solution is (1-5): 100. The invention also discloses the monocrystalline silicon surface texturing method. The method comprises the following steps: a monocrystalline silicon wafer is pretreated; and the pretreated monocrystalline silicon wafer is immersed in thetexturing agent for texturing, the texturing temperature is 70-90 DEG C, and the texturing time is 300-1200 s. The monocrystalline silicon surface treated by the texturing additive and the texturing agent achieves a good texturing effect, the textured surface size is controllable, the texturing rate is high, the reflectivity is low, one side is clean, and the service life of the texturing agent islong.

Description

technical field [0001] The invention relates to the technical field of texturing agents for monocrystalline silicon wafers, in particular to a texturing additive for surface treatment of monocrystalline silicon, a texturing agent and a method for texturing the surface of monocrystalline silicon. Background technique [0002] In the preparation process of monocrystalline silicon solar energy, in order to improve the photoelectric conversion efficiency of monocrystalline silicon solar cells, the difference in the corrosion rate of each crystal surface by alkaline solution is often used to form a "pyramid"-like suede on the surface of the silicon wafer. It can effectively enhance the absorption of incident light by the silicon wafer and increase the photogenerated current density. [0003] The ideal quality of suede should be that the size of the pyramids is uniform, and there is no gap between adjacent pyramids, which can not only obtain low surface reflectivity, but also faci...

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Problems solved by technology

For example, the invention patent with the Chinese patent application number CN201610738890.5 includes alkaline solution and monocrystalline silicon wafer texturing additive, and the mass ratio of texturing additive to alkaline solution is 0.2 to 5:100, but when the concentration of the alkaline solution exceeds a certain Boundary, the corrosion strength of the solution is too strong, the suede formation will be worse, and even the effect similar to "polishing" will appear

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