Method for preparing boron doped graphene
Patent Information
- Authority / Receiving Office
- CN · China
- Current Assignee / Owner
- SHANGHAI INST OF CERAMIC CHEM & TECH CHINESE ACAD OF SCI
- Publication Date
- 2012-06-06
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Abstract
Description
technical field
[0001] The invention relates to a method for preparing boron-doped graphene, which belongs to the technical field of preparation of graphene materials. Background technique
[0002] Graphene has atomic-scale thickness, excellent electrical properties, excellent chemical stability and thermodynamic stability, these properties make graphene have important application prospects in future nanoelectronics, and has become the current condensed matter physics and materials science research hotspot.
[0003] An important prerequisite for the application of graphene in microelectronic devices is that its band gap, carrier concentration, and carrier polarity can be adjusted, and chemical doping is an important way to achieve this adjustment. Theoretical calculations show that efficient p-type (n-type) graphene doping can be achieved by forming substituted B heteroatoms (N heteroatoms) in the carbon lattice. However, the current research is only in theory, and there a...