Conducting film or electrode with improved optical and electrical performance for display and lighting devices and solar cells
A solar cell and display device technology, applied in optics, nonlinear optics, instruments, etc., can solve problems such as device failure, poor performance, and loss of TCO conductivity
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example 1
[0046] made Figure 4 A substrate with a three-layer electrode design is shown in . The middle layer consisted of an acrylate polymer deposited using the superbarrier process noted above, and the two conductive layers consisted of sputter-deposited ITO. As indicated in Table 2, three-layer electrodes with different interlayer and ITO layer thicknesses were fabricated on a roll of 0.005 inch thick PET.
[0047]
[0048] The individual layer thicknesses were determined by the film speed in feet per minute (fpm) across the ITO and super barrier film deposition sources. Faster speeds form thinner layers. The sheet resistance of these samples was measured using a non-contact probe (Delcom) measuring the combined conductivity of the two ITO layers and a surface contact 4-probe instrument measuring the conductivity of the top exposed surface. Both measurement techniques yielded the same sheet resistance values within the measurement error, indicating that the interlayer allow...
example 2
[0054] An ITO / polymer / ITO multilayer stack was fabricated on a PET film using the same procedure used in Example 1 . Laser ablation techniques are used to create defined electrodes for OLEDs. Prior to OLED fabrication, PET films with ITO / polymer / ITO multilayer stacks were prebaked at 80° C. overnight in a nitrogen atmosphere to remove moisture from the films. Immediately before OLED fabrication, the film was subjected to a standard oxygen plasma treatment to remove organic residues from the ITO surface and tune the ITO surface properties for optimal OLED performance. At base pressure about 10 -6 OLEDs were fabricated by standard thermal deposition in a Torr vacuum system. The following OLED configurations were deposited: HIL (300 nm) / HTL (40 nm) / EML (30 nm, 6% dopant) / ETL (20 nm) / LiF (1 nm) / Al (200 nm).
[0055] After completion, encapsulate the OLED with 3M encapsulation barrier film, and use SAES getter as desiccant and oxygen scavenger between the encapsulation film and ...
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