Cleaning-free and residue-free scaling powder and preparation method thereof
A soldering flux, no residue technology, applied in the direction of welding equipment, welding medium, manufacturing tools, etc., can solve the problems that the surface of electronic components cannot be completely eliminated, residues left, low solid content, etc., to achieve good solderability, No cleaning process, strong activity effect
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Embodiment 1
[0085] The no-cleaning and residue-free soldering flux of the present invention consists of the following raw materials in percentage by weight:
[0086] Hydrogenated abietyl alcohol 0.2~2%
[0087] Adipic acid 0.1~1%
[0088] Malonic acid 0.1~1%
[0089] Glycolic acid 0.3~3%
[0090] Succinic acid 12~25%
[0091] Cyclohexylamine hydrobromide 0.05~2.5%
[0092] Nonylphenol polyoxyethylene ether 0.3~2.5%
[0093] Surfactant 0.1~1.5%
[0094] Triethylene glycol butyl ether 0.5~4%
[0095] Tetrahydrofurfuryl alcohol 0.2~3%
[0096] Anhydrous ethanol 60-80%.
[0097] Wherein, the surfactant is a nonionic or cationic fluorocarbon surfactant.
[0098] Specifically, the surfactant adopts a model of FT900 high-efficiency surfactant.
[0099] FT900 high-efficiency surfactant is produced by German OATEN (Ao Teng) company. The boiling point of this surfactant is 260 ° C. It is a colorless liquid and has no residue after welding. It can effectively increase the brightness of sol...
Embodiment 2
[0107] The no-cleaning residue-free soldering flux of this embodiment is composed of the following raw materials in weight percentage:
[0108] Hydrogenated abietyl alcohol 0.2~1.1%
[0109] Adipic acid 0.1~0.5%
[0110] Malonic acid 0.1~0.5%
[0111] Glycolic acid 0.3~1.5%
[0112] Succinic acid 15~22%
[0113] Cyclohexylamine hydrobromide 0.05~0.15%
[0114] Nonylphenol polyoxyethylene ether 0.5~2.5%
[0115] Surfactant 0.1~0.8%
[0116] Triethylene glycol butyl ether 1~3%
[0117] Tetrahydrofurfuryl alcohol 0.2~1.5%
[0118] Anhydrous ethanol 65-78%.
[0119] The preparation method is the same as in Example 1.
Embodiment 3
[0121] The no-cleaning and no-residue flux of this embodiment is based on Embodiment 2. The features not explained in this embodiment are explained in Embodiment 2. The difference between this embodiment and Embodiment 2 is:
[0122] No-clean flux, consisting of the following raw materials in weight percent:
[0123] Hydroabietyl Alcohol 0.5%
[0124] Adipic acid 0.3%
[0125] Malonic acid 0.3%
[0126] Glycolic Acid 1%
[0127] Succinic Acid 18%
[0128] Cyclohexylamine hydrobromide 0.15%
[0129] Nonylphenol ethoxylate 1%
[0130] FT900 high-efficiency surfactant 0.2%
[0131] Triisoglycol butyl ether 2%
[0132] Tetrahydroconol 1%
[0133] Absolute Ethanol 75.55%.
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