Production method of dye-sensitized TiO2 film based gas sensor

A gas sensor, pigment sensitization technology, applied in instruments, scientific instruments, measuring devices, etc., to achieve the effect of wide detection range, high sensitivity, and enhanced sensitivity

Active Publication Date: 2012-11-07
JIANGSU UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Preparation of Nanocrystalline TiO by Magnetron Sputtering 2 The thin film process is simple, and the prepared nanocrystalline TiO 2 The thin film is evenly distributed, the thickness is controllable, the surface area is large, the adhesion is strong, and it does not crack. It is easier to control the quality of the product in large-scale industrial production and reduce the overall production cost. ) to work,

Method used

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  • Production method of dye-sensitized TiO2 film based gas sensor
  • Production method of dye-sensitized TiO2 film based gas sensor
  • Production method of dye-sensitized TiO2 film based gas sensor

Examples

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Effect test

Embodiment 1

[0022] This embodiment uses synthetic pigment sensitization materials and nanocrystalline TiO 2 Combining thin films to make gas sensors, the manufacturing steps are as follows:

[0023] 1. Choose one of silicon wafer, glass wafer, conductive glass wafer and polytetrafluoroethylene wafer as the substrate.

[0024] 2. Make gold or platinum electrodes by screen printing or plasma sputtering methods, such as figure 1 Substrate 1 and electrode 2 are shown.

[0025] 3. Preparation of nanocrystalline TiO by magnetron sputtering 2 Thin film: put the substrate 1 into the base material stage, metal titanium or titanium oxide is used as the target stage, adjust the distance between the titanium target and the substrate stage to 20cm, the rotation speed of the stage is 4rp, and the magnetron The vacuum degree of the sputtering reaction chamber is pumped to at least 10 -3 Pa, the temperature is heated to 20°C, the inert gas flow is 60sccm, the magnetron sputtering power is 80w, and th...

Embodiment 2

[0029] This embodiment is to use natural pigment pigment material and nanocrystalline TiO 2 Combining thin films to make gas sensors, the manufacturing steps are as follows:

[0030] Step 1~step 3 are the same as embodiment 1.

[0031]4. Extraction and preparation of natural color-sensitive materials: Taking purple potato pigment as an example, take 10g of purple potato, wash it, cut it into cubes, put it in a tissue homogenizer, and mash it to get a slurry solution, and measure 10ml with a graduated cylinder Pour the mashed purple potato liquid into a triangular flask, then add 100ml of 1% citric acid, shake well, and place it in a constant temperature water bath at 50°C for 1 hour. After the raw material fades obviously, filter the extract with a qualitative filter paper with a diameter of 15 cm, evaporate and concentrate the extract with a rotary evaporator until the water content is 60%, and obtain the desired concentrated purple sweet potato pigment solution.

[0032] 5...

Embodiment 3

[0034] This embodiment uses synthetic pigment sensitization materials and nanocrystalline TiO 2 Combining thin films to make gas sensors, the manufacturing steps are as follows:

[0035] 1. Choose one of silicon wafer, glass wafer, conductive glass wafer and polytetrafluoroethylene wafer as the substrate.

[0036] 2. Make gold or platinum electrodes by screen printing or plasma sputtering methods, such as figure 1 Substrate 1 and electrode 2 in.

[0037] 3. Preparation of nanocrystalline TiO by magnetron sputtering 2 Thin film: put the substrate into the substrate stage, metal titanium or titanium oxide is used as the target stage, adjust the distance between the titanium target and the substrate stage to 25cm, the rotation speed of the stage is 6rp, magnetron sputtering The vacuum degree of the injection reaction chamber is pumped to at least 10 -3 Pa, the temperature is heated to 100°C, the inert gas flow is 80sccm, the magnetron sputtering power is 100w, and the sputter...

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Abstract

The invention discloses a production method of a dye-sensitized TiO2 film based gas sensor. The method comprises steps of: choosing a substrate suitable for subsequent film plating; preparing electrodes on the substrate through a film plating method; preparing a nanocrystalline TiO2 film on the substrate with electrodes by a magnetron sputtering method; selecting a suitable dye sensitizing material according to gas to be tested and dissolving the dye sensitizing material in a compatible solvent to prepare a dye solution; immersing the nanocrystalline TiO2 film into the dye solution for 12-8 h; taking out the nanocrystalline TiO2 film; removing impurities with ethanol; and drying and baking in an oven at 30-80 DEG C for 1-5 h. According to the invention, the nanocrystalline TiO2 film is employed as the substrate material, and the dye sensitizing material is employed as a sharpening material; dye molecules encapsulate the TiO2 molecules while filling gaps between the TiO2 crystals; and the gas sensor can be used for qualitative and quantitative analysis on gas at room temperature through changes of the sensor resistance, and has high sensitivity and wide detection range.

Description

technical field [0001] The invention relates to a manufacturing method of a gas sensor, in particular to a gas sensor used in magnetron sputtering titanium dioxide (TiO 2 ) A method for making a gas sensor with a pigment added to a gas sensitive film. Background technique [0002] In recent years, with the development of science and technology, people have higher and higher requirements for harmful gas detection, and the demand for gas sensors is also increasing. Most of the current gas sensors are not sensitive enough to low-concentration gas detection. In order to overcome the above shortcomings, doping other metal or oxide additives in the gas sensor, preparing composite metal oxide gas-sensing materials, etc. have achieved better results. Among them, TiO 2 The film has the characteristics of high refractive index, high dielectric constant, etc., for example: Chinese patent number ZL201010206483.2, named as the preparation method of titanium dioxide porous film, Chines...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G01N27/04
CPCG01N33/0027G01N27/12G01N27/127
Inventor 邹小波黄晓玮石吉勇陈正伟张德涛
Owner JIANGSU UNIV
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