CIGS thin film type solar cell device and preparation method thereof
A solar cell, copper indium gallium selenide technology, applied in circuits, photovoltaic power generation, electrical components, etc., can solve problems such as difficult crystallization quality copper indium gallium selenide light absorption layer, affecting battery conversion efficiency, etc.
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[0033] The preparation method of the CIGS thin-film solar cell of an embodiment, comprises the steps:
[0034] Step S1: attaching a graphene film on the substrate as a back electrode layer. Specifically include the following steps:
[0035] Step S11, using chemical vapor deposition (CVD) to prepare single-layer graphene on the metal substrate: under high temperature conditions, by chemical vapor deposition, in carbon source gas, H 2 or H 2 In a mixed gas atmosphere with Ar, a single-layer graphene film with low sheet resistance and high transmittance was prepared using a metal substrate as a catalyst.
[0036] For example, it can be realized by but not limited to the following steps: put the cleaned Cu sheet into the CVD furnace, turn on the mechanical pump, and evacuate to the background vacuum (about a dozen mTorr); adjust the flow meter to feed a certain amount of H 2 , such as 20sccm, and adjust the air pressure regulating valve to maintain the chamber air pressure at a...
Embodiment 1
[0051] 1. Put the cleaned Cu chip into the CVD furnace, turn on the mechanical pump, and pump air until the background vacuum is 13mTorr. Adjust the flow meter into 20sccm H 2 , and adjust the air pressure regulating valve to maintain the cavity air pressure at about 300mTorr. Then the temperature is raised to 1000°C, and high-temperature hydrogen annealing is performed at this temperature for about 25 minutes. Open CH at this time 4 Flow control, so that the flow is 10sccm, adjust H 2 The flow rate is 5 sccm, the working air pressure is about 350mTorr at this time, and the heating temperature is kept constant, and the whole process lasts for about 30 minutes. After the end, the temperature was lowered, and the sample was taken out, that is, a single-layer graphene was prepared on the Cu substrate.
[0052] 2. Coating a layer of PMMA on the surface of single-layer graphene on Cu substrate by spin coating method. Put the non-adhesive side of the uniformly glued Cu sheet in...
Embodiment 2
[0056] 1. Put the cleaned Cu chip into the CVD furnace, turn on the mechanical pump, and pump air until the background vacuum is 13mTorr. Adjust the flow meter into 20sccm H 2 , and adjust the air pressure regulating valve to maintain the cavity air pressure at about 300mTorr. Then the temperature is raised to 1000°C, and high-temperature hydrogen annealing is performed at this temperature for about 25 minutes. Open CH at this time 4 Flow control, so that the flow is 10sccm, adjust H 2 The flow rate is 5 sccm, the working air pressure is about 350mTorr at this time, and the heating temperature is kept constant, and the whole process lasts for about 30 minutes. After the end, the temperature was lowered, and the sample was taken out, that is, a single-layer graphene was prepared on the Cu substrate.
[0057] 2. Coating a layer of PMMA on the surface of single-layer graphene on Cu substrate by spin coating method. Put the non-adhesive side of the uniformly glued Cu sheet in...
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