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Processing method for improving toughness of hard film

A processing method and thin film technology, applied in ion implantation plating, metal material coating process, coating, etc., can solve the problems of small effect and limited wide use, so as to improve brittle fracture resistance, solve brittle failure, and improve toughness Effect

Active Publication Date: 2013-03-13
NORTHWEST INSTITUTE FOR NON-FERROUS METAL RESEARCH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

In practical applications, it is the brittle fracture failure of the hard film due to the high stress on the surface during use that limits its wide use in the industrial field.
Researchers have tried to improve the toughness of the hard film by changing the composition ratio and microstructure of the hard film, and even adopting a multi-layer composite structure, but with little success

Method used

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  • Processing method for improving toughness of hard film
  • Processing method for improving toughness of hard film
  • Processing method for improving toughness of hard film

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0027] The treatment method for improving the toughness of the hard film in this embodiment is: using physical vapor deposition method (specifically arc ion plating assisted enhanced magnetron sputtering) to prepare SiCN with a thickness of 10 μm and a Vickers hardness of 42 GPa on the surface of a single crystal Si substrate. Hard film; then use the MEVVA source (i.e. metal vapor vacuum arc ion source) ion implanter to implant ions into the SiCN hard film, using a graphite target with a mass purity of 99.99%, the implanted ion energy is 10kev, and the implanted ion The dose is 5 x 10 15 ions / cm 2 , the implanted ions are carbon ions.

[0028] The SiCN hard film before ion implantation in this embodiment was subjected to a Vickers hardness test under the condition of a load of 5N, and the obtained indentation fracture morphology was as follows figure 1 As shown, according to the formula, the toughness value of the SiCN hard film before implanting ions in this embodiment is 0...

Embodiment 2

[0030] The treatment method for improving the toughness of the hard film in this embodiment is: using physical vapor deposition (specifically magnetron sputtering) to prepare a TiAlSiN hard film with a thickness of 8 μm and a Vickers hardness of 36 GPa on the surface of the W18Cr14V high-speed steel substrate; and then Use the MEVVA source (metal vapor vacuum arc ion source) ion implanter to implant ions into the TiAlSiN hard film, use a pure aluminum target with a mass purity of 99.99%, the implanted ion energy is 70kev, and the implanted ion dose is 6×10 16 ions / cm 2 , the implanted ions are aluminum ions.

[0031] The toughness value of TiAlSiN hard film before ion implantation in this example is 0.64MPa·m 1 / 2 , the toughness value of TiAlSiN hard film after ion implantation in this example is 6.3MPa·m 1 / 2 , indicating that the toughness of the TiAlSiN hard film is significantly improved after ion implantation in this embodiment.

Embodiment 3

[0033] The treatment method for improving the toughness of the hard film in this embodiment is: using physical vapor deposition method (specifically arc ion plating) to prepare a TiCrAlN hard film with a thickness of 5 μm and a Vickers hardness of 28 GPa on the surface of the cemented carbide substrate; The MEVVA source (metal vapor vacuum arc ion source) ion implanter implants ions into the TiCrAlN hard film, using a pure chromium target with a mass purity of 99.99%, the implanted ion energy is 150kev, and the implanted ion dose is 3×10 13 ions / cm 2 , the implanted ions are chromium ions.

[0034] The toughness value of TiCrAlN hard film before ion implantation in this example is 0.71MPa·m 1 / 2 , the toughness value of TiCrAlN hard film after ion implantation in this example is 6.14MPa·m 1 / 2 , indicating that the toughness of the TiCrAlN hard film is significantly improved after ion implantation in this embodiment.

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Abstract

The invention provides a processing method for improving toughness of a hard film, and the method comprises the following step of: injecting ions into the hard film by adopting an ion injecting machine, wherein energy of injected ions is 10-150kev, dosage of the injected ions is 1*10<11>-6*10<16>ions / cm<2>, the injected ions are one or more than one components of the hard film, and the hard film is a metal nitride film with Vickers hardness of no less than 20GPa. According to the processing film provided by the invention, ions are injected into the hard film by adopting an ion injecting technology, and the pinning effect and the pressure stress effect can be formed, so that initiation of a micro crack on the surface of the hard film is inhibited; and crest truncation on the micro crack of the hard film is realized, and the micro crack is prevented from expanding inside the film, so that brittle fracture resistance of the film is improved, the toughness of the hard film is obviously improved, and the problem that the brittleness of the hard film is invalid in a using process is solved.

Description

technical field [0001] The invention belongs to the technical field of film material preparation, and in particular relates to a treatment method for improving the toughness of a hard film. Background technique [0002] As an effective means to improve the surface properties of workpieces, hard films are widely used as surface protection for construction machinery parts due to their high hardness, high wear resistance and high chemical stability, which significantly improves the service life of workpieces. With the improvement of the requirements for the surface protection performance of parts, nanocomposite superhard films with higher hardness have attracted more and more attention from material workers, and have achieved better protection effects than hard films. For example, by depositing TiAlN, TiAlCrN and other ternary and quaternary hard films with a Vickers hardness of 20GPa to 24GPa on the surface of the cemented carbide tool, the service life of the tool can be incr...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/48C23C14/06
Inventor 王彦峰李争显王宝云杜继红华云峰姬寿长
Owner NORTHWEST INSTITUTE FOR NON-FERROUS METAL RESEARCH
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