Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Narrow linewidth excimer laser

An excimer laser, narrow linewidth technology, applied in lasers, phonon exciters, laser parts and other directions, can solve the problems of easy damage of ultraviolet etalon, lower output energy, high energy density, and achieve compact structure, cavity Reduce internal loss and improve the effect of laser energy

Inactive Publication Date: 2013-03-20
SHANGHAI INST OF OPTICS & FINE MECHANICS CHINESE ACAD OF SCI
View PDF7 Cites 10 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The optical path is complicated, the installation and adjustment are difficult and the output energy is greatly reduced
On the other hand, in the prior art [T.J.Pacala, I.S.McDermid, J.B.Laudenslager.Ultranarrow linewidth, magnetically switched, long pulse, xenon chloride laser.Appl.Phys.Lett.44,658-660(1984)] put the ultraviolet etalon in A very narrow line width can be obtained in the laser cavity, but due to the multiple reflections of the laser beam in the UV etalon, the energy density is high, and the UV etalon is easily damaged, so it is only suitable for low pulse energy operation

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Narrow linewidth excimer laser
  • Narrow linewidth excimer laser
  • Narrow linewidth excimer laser

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0015] see figure 1 , figure 1 It is a structural block diagram of the narrow linewidth excimer laser of the present invention. It can be seen from the figure that the narrow linewidth excimer laser of the present invention is composed of a prism beam expander system 1, an ultraviolet grating 2, an ultraviolet etalon 3, a discharge cavity 4 and a coupling output mirror 5, and the positional relationship of the above-mentioned parts is as follows:

[0016] The excimer laser is excited in the discharge cavity 4, and the line width is narrowed by the prism beam expander system 1 and the ultraviolet grating 2. After the narrow line width laser is oscillated and amplified between the ultraviolet grating 2 and the output coupling mirror 5, it is coupled from the output Mirror 5 output. The output narrow-linewidth laser is output through the ultraviolet etalon 3 placed outside the cavity and perpendicular to the optical path, and the laser incident angle of the ultraviolet grating ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
Angle of incidenceaaaaaaaaaa
Diffraction angleaaaaaaaaaa
Login to View More

Abstract

A narrow linewidth excimer laser consists of a prism beam expanding system, an ultraviolet grating, an ultraviolet etalon, a discharging chamber and a coupling output mirror. Excimer laser is subjected to linewidth reduction by the prism beam expanding system and the ultraviolet grating; and the output linewidth laser passes through the ultraviolet etalon which is placed vertical to a light path and outside a resonant cavity to further reduce the spectrum. The narrow linewidth excimer laser provided by the invention is compact in structure, simple in adjustment, low in loss of the cavity and high in gain, so that the linewidth spectrum and high output energy index can be acquired at the same time.

Description

technical field [0001] The invention relates to an excimer laser, in particular to an excimer laser with narrow line width, which has compact structure, simple assembly and adjustment, small cavity loss and high gain, and can simultaneously obtain narrow line width and high output energy index. Background technique [0002] Excimer lasers with narrow linewidths are currently the main laser light sources for semiconductor lithography. The narrowing of spectral line width in commercial lithography machines mainly adopts the combination module of prism beam expander system and ultraviolet grating. However, in order to obtain a narrow linewidth laser, it is often necessary to use multiple prisms, such as the four prisms in the prior art [ZL200910052119.2]. The optical path is complicated, the installation and adjustment are difficult and the output energy is greatly reduced. On the other hand, in the prior art [T.J.Pacala, I.S.McDermid, J.B.Laudenslager.Ultranarrow linewidth, ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): H01S3/08H01S3/10
Inventor 袁志军张海波周军楼祺洪魏运荣
Owner SHANGHAI INST OF OPTICS & FINE MECHANICS CHINESE ACAD OF SCI
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com