Precision-type mischmetal polishing powder and preparation method thereof

Abstract

The invention provides precision-type mischmetal polishing powder and a preparation method thereof. The precision-type mischmetal polishing powder is a uniform solid solution composed of an oxyfluoride-crystal form rare earth and a cubic-phase rare-earth oxide. Compared with the existing products, the precision-type mischmetal polishing powder has the advantages that 1, through ball-milling crushing and utilization of a homogenization assistant, a rare-earth carbonate precursor comprises uniform crystal grains; a fluorination reaction is uniform and complete; dissociative fluorinions and fluorides influencing a polishing precision and a polishing rate are not produced; and a high crystallization degree is obtained; 2, wear resistance is good; a polishing rate is fast; and a polishing precision can be controlled easily; 3, product uniformity is good; production efficiency is high; pollution is not produced; and a cost is low; and 4, the precision-type mischmetal polishing powder is suitable for surface polishing processing of precision components such as integrated circuits, flat panel displays and optical glass in the electronic information industry and realizes the purpose of the invention.

Description

technical field [0001] The invention relates to a rare earth polishing powder and a preparation method thereof, in particular to a precision mixed rare earth polishing powder used for surface polishing of precision devices in electronic information industries such as integrated circuits, flat displays, and optical glasses, and a preparation method thereof. Background technique [0002] In recent years, rare earth polishing powder with cerium oxide as the main component has been widely used in the surface polishing of glass substrates such as lenses, flat glass, liquid crystal displays (LCD), glasses, optical components and ceramic materials. With the rapid development of electronic information technology and the widening of the application field of polishing powder, the demand for polishing powder is constantly increasing, and higher requirements are put forward for its precision and polishing rate, which prompts manufacturers to continuously improve product grades. To meet ...

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Problems solved by technology

[0008] The original grain size of the polishing powder produced by the above-mentioned existing production process is not uniform, so the uniformity of the reaction with fluorine is not consistent. On the one hand, it will affect the crystallinity of the product after roasting, and on the other hand, it will produce free states that affect the polishing accuracy and speed. Fluoride ions, the size and strength of the agglomerated particles formed after sintering are also very different, and the polishing accuracy and polishing rate of the polishing powder are mainly determined by the size and agglomerated strength of the agglomerated particles formed after high temperature sintering, which will lead to a A series of problems, such as scratches on the polished glass surface or a rapid decrease in the polishing rate in a very short period of time, especially when polishing hard glass surfaces, the rapid decrease in the polishing rate is fatal

[0009] In order to meet the conditions, it is necessary to select a polishing powder product with a certain agglomeration strength and a certain particle size, and these characteristics are difficult to control, and the production process is complicated, the cost increases and the introduction of impurity ions causes quality fluctuations

[0010] For example, although the invention patent with the patent publication number CN1903962A discloses a method for preparing rare earth polishing powder using ammonium oxalate as a precipitating agent, the method uses a surfactant to control the size of the precursor, but the defect of this method is that there are too many small-sized particles , making the polishing rate severely flawed

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