Thermal field structure for casting polycrystalline silicon ingot
A polycrystalline silicon ingot and thermal field technology, which is applied in the directions of polycrystalline material growth, crystal growth, single crystal growth, etc., can solve the problems of low conversion efficiency and battery conversion efficiency, so as to improve conversion efficiency, reduce crystal defects, and suppress crystal The effect of defect generation
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[0019] Such as Figure 2-3 As shown, a thermal field structure for casting polycrystalline silicon ingots includes a quartz crucible 1, a heat insulation plate 2, a side heater 9, a heat insulation layer 6, and a heat exchange table 5. The quartz crucible 1 is set on the heat exchange table 5. The outer wall is provided with a crucible guard plate 12, the quartz crucible 1 is surrounded by a heat insulation plate 2, and the outer side of the heat insulation plate 1 is provided with a side heat insulation layer 6, and a side heater is provided between the two 9. The distance between the outer wall of the heat insulation board 2 and the side heater 9 is greater than 1 cm, and the distance between the inner wall and the outer wall of the quartz crucible 1 is less than 5 cm, and the heat insulation board 2 is fixed on the side heat insulation layer 6 At the bottom, the upper part of the quartz crucible 1 is provided with an upper heat insulation layer 7, and the l...
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