Multilayer dielectric etching method
A multi-layer dielectric, etching gas technology, applied in electrical components, semiconductor/solid-state device manufacturing, circuits, etc., can solve problems such as difficulty in implementation, thin dielectric layer thickness, affecting the quality of the etching structure, etc., to adjust the etching rate. , the effect of increasing the etching rate
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[0038] In order to make the purpose, technical solution and advantages of the present invention clearer, the following will further describe the implementation of the present invention in detail in conjunction with the accompanying drawings. Those skilled in the art can easily understand other advantages and effects of the present invention from the contents disclosed in this specification. The present invention can also be implemented or applied through other different specific implementation modes, and various modifications or changes can be made to the details in this specification based on different viewpoints and applications without departing from the spirit of the present invention.
[0039] figure 2 It is a flow chart of the steps of the multilayer dielectric etching method provided by the present invention.
[0040] Such as figure 2 As shown, the multilayer dielectric etching method provided in this specific embodiment includes the following steps:
[0041] Step ...
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