Function coating imaging-self method of polydimethylsiloxane three-dimensional structure
A technology of polydimethylsiloxane and dimethylsiloxane, which is applied in the field of self-patterning of functional coatings of polydimethylsiloxane three-dimensional structure, achieves high coverage, easy observation and control, and good effect. excellent effect
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment 1
[0034] Such as Figure 1-7 Shown in, (a) roughening of SU-8 pattern; b) Deposition C x f y polymer; (c) polydimethylsiloxane casting and release; (d) covering polydimethylsiloxane with a volatile solution; (e) evaporating until the solution only remains on the rough surface; (f ) coating curing; (g) polydimethylsiloxane-glass bonding. The process flow is as follows:
[0035] 1) Fabrication of three-dimensional microstructure: uniformly coat the SU-8 negative resist layer on the silicon wafer; after alignment and photolithography, perform photolithography treatment on the SU-8 negative resist layer to form a number of penetrating second photoresist layers through holes, and three-dimensional microstructures are arranged between adjacent through holes;
[0036] 2) Wetting property modification: use oxygen plasma etching surface treatment technology to make the surface of the three-dimensional microstructure rough, while the substrate remains smooth;
[0037] 3) Deposition: ...
Embodiment 2
[0055] This embodiment is the same as Embodiment 1 except for the following features: the functional coating material is glass resin, the commercial model is GR650 F; the solvent is toluene, and the concentration of toluene is 1-35 wt%. Among them, GR650F with a concentration of 3.5 wt%, was uniformly covered by the toluene solution in the polydimethylsiloxane (PDMS) microwell after curing.
PUM
Property | Measurement | Unit |
---|---|---|
boiling point | aaaaa | aaaaa |
thickness | aaaaa | aaaaa |
Abstract
Description
Claims
Application Information
- R&D Engineer
- R&D Manager
- IP Professional
- Industry Leading Data Capabilities
- Powerful AI technology
- Patent DNA Extraction
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com