Method for fossilizing pectinase by using nanometer silicon material
A technology of immobilizing pectinase and nano-silicon, which is applied in the direction of immobilizing on or in the inorganic carrier, can solve the problems of difficult to realize large-scale commercial production, high production cost and low content, and achieve low cost, The effect of small loss of enzyme activity and uniform particle size distribution
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example 1
[0015] 4. 2g F127, 20g potassium chloride, 250ml deionized water, 50ml hydrochloric acid, mix them into the interlayer beaker, add TMB, after stirring for 3h, add 20ml of ethyl orthosilicate drop by drop, stir for 20h, put in the kettle. Put it in an oven at 110°C for crystallization, and take it out after 24 hours. Dry at 80-100°C for 12 hours. Put into the muffle furnace for calcination. The temperature was raised to 450°C at 5°C / min, kept for 6h, and the nano-silicon material was obtained after cooling. Weigh 0.6g of sodium dodecylsulfonate, add 100ml of double-distilled water, and heat to dissolve; weigh 1.5g of the treated nano-silicon material, add it to the above solution, sonicate for 10min, and soak for 24h. Pour off the unadsorbed sodium dodecylsulfonate solution in the upper layer, add 50ml of 1.0% chitosan solution, and soak for 12h. Centrifuge the nano-silicon material, add 20ml of 2.5% glutaraldehyde solution, cross-link for 4 hours, wash with water and centri...
example 2
[0017] 5.0g F127, 20g potassium chloride, 250ml deionized water, 55ml hydrochloric acid, mix them into the interlayer beaker, add TMB1.0ml, after stirring for 3h, add 22ml of ethyl orthosilicate drop by drop, stir for 20h, put into the kettle. Put it in an oven at 110°C for crystallization, and take it out after 24 hours. Dry at 80-100°C for 12 hours. Put into the muffle furnace for calcination. The temperature was raised to 450°C at 5°C / min, kept for 6h, and the nano-silicon material was obtained after cooling. Weigh 0.7g of sodium dodecylsulfonate, add 100ml of double-distilled water, and heat to dissolve; weigh 1.4g of the treated nano-silicon material, add it to the above solution, sonicate for 12min, and soak for 24h. Pour off the unadsorbed sodium dodecylsulfonate solution in the upper layer, add 50ml of 1.0% chitosan solution, and soak for 12h. Centrifuge the nano-silicon material, add 20ml of 2.2% glutaraldehyde solution, cross-link for 4 hours, wash and centrifuge,...
example 3
[0019] 4.0g F127, 23g potassium chloride, 250ml deionized water, 50ml hydrochloric acid, mix them into the interlayer beaker, add TMB, after stirring for 3h, add 22ml of ethyl orthosilicate drop by drop, stir for 23h, put into the kettle. Put it in an oven at 120°C for crystallization, and take it out after 24 hours. Dry at 80-100°C for 12 hours. Put into the muffle furnace for calcination. The temperature was raised to 450°C at 5°C / min, kept for 6h, and the nano-silicon material was obtained after cooling. Weigh 0.55g of sodium dodecylsulfonate, add 100ml of double-distilled water, and heat to dissolve; weigh 1.5g of the treated nano-silicon material, add it to the above solution, sonicate for 10min, and soak for 24h. Pour off the unadsorbed sodium dodecylsulfonate solution in the upper layer, add 45ml of 1.2% chitosan solution, and soak for 12h. Centrifuge the nano-silicon material, add 25ml of 2.0% glutaraldehyde solution, cross-link for 4 hours, wash with water and cent...
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