Process for plating precious metal film on porous ceramic based on magnetron sputtering through vacuum plating
A technology for porous ceramics and precious metals, which is applied in the field of ceramic vacuum coating process and the process field of porous ceramic vacuum coating precious metal film, can solve the problems of poor compactness and homogeneity, uneven thickness of metal film, thin thickness of ceramic palladium film, etc. , to achieve good homogeneity, uniform metal film thickness, and improve the effect of compactness
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[0048] see figure 1 , the present invention discloses a process for vacuum-plating precious metal films on porous ceramics based on magnetron sputtering, said process comprising the following steps:
[0049] [Step S1] The porous ceramic is placed in a vacuum chamber of a magnetron sputtering device.
[0050] [Step S2] Use the magnetic field generating mechanism of the magnetron sputtering device to generate a magnetic field, so that the metal target generates a bias current, and the metal target is used as a negative pole, so that the surface of the porous ceramic has a magnetic layer; the material of the metal target is expensive sputtering Metal; in the present embodiment, described precious metal is palladium-silver alloy, and mass percentage palladium accounts for 75%~78%, and silver accounts for 22%~25%; Such as, palladium-silver alloy comprises 75% palladium (mass percentage, the same below ), 25% silver, or 78% palladium, 22% silver. In addition, palladium silver allo...
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