A kind of preparation method of anti-reflection glass and its coating equipment
A technology of anti-reflection glass and coating equipment, which is applied in the field of deep processing of float glass, which can solve the problems of weak film layer, hindering popularization and application, and short service life, so as to achieve firm combination, reduce glass reflectivity, and reduce production costs Effect
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example 1
[0068] Example 1: The flat glass formed by the conventional float glass production line enters the temperature range of 500-600 ° C in the annealing kiln, starts the coating reactor, and sprays the plating solution vertically from the atomizing nozzle to the glass plate that is moving downwards, and passes through The chemical vapor deposition method is deposited on the glass plate surface to form an anti-reflection film layer; wherein the preparation of the plating solution:
[0069] 1) Take by weight: 90 parts of ethyl silicate for silicon source, 7 parts of trifluoroacetic acid for fluorine source dopant, 0.2 part of ethyl acetate for stabilizer, 0.1 part of ammonia water for catalyst and 2.7 parts of hydrogen peroxide for oxidant Mix evenly in advance and place it for 5 days to make it fully homogenized.
[0070] 2) Put the homogenized plating solution in step 1) into the liquid storage tank, and pressurize it to 5-10MPa through a booster pump; then put it into the plating...
example 2
[0071] Example 2: The basic steps are the same as Example 1, the difference is: the preparation of the plating solution: 95 parts of orthobutyl silicate are selected as the silicon source, 3 parts of magnesium fluoride are selected as the fluorine source dopant, and 0.6 parts of methyl methacrylate is used as the stabilizer. 0.4 part of ammonia water for catalyst and 1 part of sodium hypochlorite for oxidant were pre-mixed evenly and left for 3 days to make it fully homogenized.
example 3
[0072] Example 3: The basic steps are the same as Example 1, the difference is: the preparation of the plating solution: 92 parts of silane for silicon source, 3 parts of magnesium fluoride for fluorine source dopant, butyl methacrylate or methyl isobutyl for stabilizer 1 part of base ketone, 1 part of ammonia water for catalyst and 3 parts of hydrogen peroxide for oxidant were pre-mixed evenly, and left for 5 days to make it fully homogenized.
[0073] In the above examples, the thickness of the anti-reflection film layer formed by the plating solution is usually 200-500 nm, which is generally determined according to product requirements.
[0074] The working principle of the present invention is: in the area of 500-600 ℃ of the float glass annealing kiln, using the temperature of the annealing kiln, the coating reactor squeezes the high-pressure plating solution through the atomization nozzle, and cuts the plating solution into fine and uniform fine mist Drops, produce ato...
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