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Method for fabricating patterned sapphire substrate by nanoimprint technology without residual layer

A patterned sapphire and nano-imprinting technology, which is applied in the direction of optomechanical equipment, photo-plate making process of pattern surface, optics, etc., can solve the problems of nano-imprinting residual layer, etc., and achieve industrialization, short process, and pattern resolution high rate effect

Active Publication Date: 2016-02-17
WUXI IMPRINT NANO TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] The main purpose of the present invention is to solve the problem of the residual layer in the process of nanoimprinting, and provide a new method for patterning the sapphire substrate

Method used

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  • Method for fabricating patterned sapphire substrate by nanoimprint technology without residual layer
  • Method for fabricating patterned sapphire substrate by nanoimprint technology without residual layer
  • Method for fabricating patterned sapphire substrate by nanoimprint technology without residual layer

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specific Embodiment approach

[0024] (1) Anti-adhesive treatment of composite formwork

[0025] Select a grating composite template with a period of 550nm and a depth of 110nm, and perform oxygen plasma treatment on the surface of the composite template for a very short time, so that a very thin layer of silicon dioxide is formed on the surface of the rigid structure layer, and then passed through the anti-adhesive agent in the vacuum desiccator Anti-adhesive treatment of composite formwork by gasification method.

[0026] (2) Selection and control of embossing film thickness

[0027] For the calculation of the duty cycle of the composite template, the depth of the template used is 110nm, the duty ratio is 1:1, the film thickness of the suitable imprinting glue is 55nm, the experimental control film thickness is between 50nm-55nm, and BYK3570 ultraviolet light is selected Take curing glue as an example, the concentration of the glue used is 2%, the speed of glue application is 3000rpm, the time of glue ap...

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Abstract

The invention discloses a method for manufacturing a patterned sapphire substrate with a residual-layer-free nano-imprinting technology. The method comprises the steps that (1) adhesion preventing treatment is carried out on the surface of a composite nano-imprinting template; (2) a proper gumming thickness is selected to carry out imprinting by calculating the feature and the duty ratio of the patterns of the composite nano-imprinting template; (3) the gumming thickness is controlled by controlling the gum evening speed, gum evening time and concentration of nano-imprinting gum and other influence factors, and the sapphire substrate is coated with the imprinting gum; (4) pressurization is gradually carried out through quartz plates to carry out imprinting, proper imprinting pressure is selected, exposure is carried out for 15 minutes under ultraviolet light, and nano-imprinting gum is solidified; (5) the quartz plates and the composite nano-imprinting template are removed, residual-layer-free nano-imprinting patterns are obtained, the patterns are used as masks, and the sapphire substrate is etched to obtain the patterned sapphire substrate. The patterned substrate copied through the method is high in pattern resolution ratio, good in repeatability and more beneficial for the industrialization of the patterned sapphire substrate.

Description

technical field [0001] The invention belongs to the field of micro-nano processing, and in particular relates to a non-residual layer composite nano-imprinting technology and a preparation method of a patterned sapphire substrate. Background technique [0002] Due to its energy saving, environmental protection, long life, low energy consumption, small size, flexible application, and convenient control, LED is recognized as a new type of solid-state cold light source that is most likely to enter the field of general lighting, and has become the focus of global attention in recent years. . Sapphire crystal is currently the most widely used substrate material in the development of semiconductor lighting industry. The patterning of the sapphire substrate refers to the fabrication of patterns with fine structures on the surface of the sapphire substrate. The epitaxy of LED materials can be carried out on the surface of this patterned substrate. At the same time, this patterned ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/00H01L33/00
CPCG03F7/0002H01L33/007H01L33/22
Inventor 崔玉双袁长胜
Owner WUXI IMPRINT NANO TECH
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