Method for fabricating patterned sapphire substrate by nanoimprint technology without residual layer

Abstract

The invention discloses a method for manufacturing a patterned sapphire substrate with a residual-layer-free nano-imprinting technology. The method comprises the steps that (1) adhesion preventing treatment is carried out on the surface of a composite nano-imprinting template; (2) a proper gumming thickness is selected to carry out imprinting by calculating the feature and the duty ratio of the patterns of the composite nano-imprinting template; (3) the gumming thickness is controlled by controlling the gum evening speed, gum evening time and concentration of nano-imprinting gum and other influence factors, and the sapphire substrate is coated with the imprinting gum; (4) pressurization is gradually carried out through quartz plates to carry out imprinting, proper imprinting pressure is selected, exposure is carried out for 15 minutes under ultraviolet light, and nano-imprinting gum is solidified; (5) the quartz plates and the composite nano-imprinting template are removed, residual-layer-free nano-imprinting patterns are obtained, the patterns are used as masks, and the sapphire substrate is etched to obtain the patterned sapphire substrate. The patterned substrate copied through the method is high in pattern resolution ratio, good in repeatability and more beneficial for the industrialization of the patterned sapphire substrate.

Description

technical field

[0001] The invention belongs to the field of micro-nano processing, and in particular relates to a non-residual layer composite nano-imprinting technology and a preparation method of a patterned sapphire substrate. Background technique

[0002] Due to its energy saving, environmental protection, long life, low energy consumption, small size, flexible application, and convenient control, LED is recognized as a new type of solid-state cold light source that is most likely to enter the field of general lighting, and has become the focus of global attention in recent years. . Sapphire crystal is currently the most widely used substrate material in the development of semiconductor lighting industry. The patterning of the sapphire substrate refers to the fabrication of patterns with fine structures on the surface of the sapphire substrate. The epitaxy of LED materials can be carried out on the surface of this patterned substrate. At the same time, this patterned ...

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