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A kind of preparation method of ultrapure isopropanol

A technology of ultra-pure isopropanol and isopropanol, which is applied in the preparation of organic compounds, chemical instruments and methods, preparation of hydroxyl compounds, etc., can solve the problems of high content of impurity metal ions, difficult cost reduction, and difficult post-processing, etc. Achieve the effects of low content of impurity metal ions, less clogging and simple operation

Active Publication Date: 2016-03-30
SHANGHAI CHEM REAGENT RES INST
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] The problem to be solved by the present invention is to provide a preparation method of ultra-pure isopropanol, so as to overcome the deficiencies in the prior art of water content, high content of impurity metal ions, difficult post-processing, and difficult cost reduction.

Method used

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  • A kind of preparation method of ultrapure isopropanol
  • A kind of preparation method of ultrapure isopropanol
  • A kind of preparation method of ultrapure isopropanol

Examples

Experimental program
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Effect test

Embodiment 1

[0023] refer to figure 1 , at normal temperature and pressure, add 2.0g of ethylenediaminetetraacetic acid disodium salt into 200l of industrial grade isopropanol, stir well and enter electrophoresis tank 2 for 30 minutes of separation. Under the pressure of 0.6MPa, the The flow rate of 80l / h passes through the cation exchange column 3 equipped with strongly acidic D002 large-pore sulfonic acid-based polystyrene resin, the anion-exchange column 4 equipped with strong basic D201 large-pore styrene resin, and then enters the 4A molecular sieve Molecular sieve dryer 5 absorbs and dehydrates, and controls the water content to be less than 90ppm; dehydrates through the resin dryer 6 equipped with super absorbent resin at a constant flow rate of 80l / h, controls the water content to be less than 10ppm, and continues to enter at a flow rate of 80l / h Microfilter 7, with a working pressure of 0.6MPa, removes impurity particles; enters a tetrafluoroethylene-lined four-stage rectification...

Embodiment 2

[0025] refer to figure 1 , at normal temperature and pressure, add 6.0g of ethylenediaminetetraacetic acid disodium salt into 300l of industrial grade isopropanol, stir well and enter electrophoresis tank 2 for 40 minutes of separation. The flow rate of / h passes successively through the cation exchange column 3 equipped with strongly acidic D002 large-aperture sulfonic acid-based polystyrene resin, the anion-exchange column 4 equipped with strongly basic D201 large-aperture styrene resin, and then enters the 4A molecular sieve. Molecular sieve dryer 5 absorbs and dehydrates, and controls the water content to be less than 90ppm; dehydrates through the resin dryer 6 equipped with super absorbent resin at a constant flow rate of 100l / h, controls the water content to be less than 10ppm, and continues to enter the micro at a flow rate of 100l / h Filter 7, the working pressure is 0.6MPa, remove impurity particles; enter the four-stage rectification tower 8 lined with tetrafluoroethy...

Embodiment 3

[0027] refer to figure 1 , at normal temperature and pressure, add 20.0g of ethylenediaminetetraacetic acid disodium salt (EDTA) into 400l of industrial grade isopropanol, stir well and enter electrophoresis tank 2 for 60 minutes of separation, under the pressure of 1.0MPa , pass through the cation exchange column 3 that strongly acidic D002 large-pore diameter sulfonic acid group polystyrene resin is housed, the anion-exchange column 4 that strongly basic D201 large-pore diameter styrene resin is housed with the flow velocity of 150l / h successively, then enter the house that is equipped with Molecular sieve drier 5 of 4A molecular sieve absorbs and dehydrates, and controls the water content to be less than 90ppm; dehydrates through the resin drier 6 equipped with super absorbent resin at a constant flow rate of 150l / h, controls the water content to be less than 10ppm, and continues to flow at 150l / h The flow rate enters the microfilter 7, and the working pressure is 0.6MPa to...

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Abstract

The invention discloses a preparation method of ultrapure isopropanol, which comprises the following steps: by using industrial isopropanol as a raw material, adding a metal ion complexing agent ethylene diamine tetraacetic acid disodium salt to form a charged chelate, moving charged corpuscles to positive and negative poles through an electrophoresis tank, removing impurity ions in the isopropanol respectively by anion and cation exchange resin exchange, dehydrating through a molecular sieve and a superstrong water-absorbing resin, filtering with a microfilter, carrying out multistage continuous rectification, and filtering with a nanofilter to obtain the target product ultrapure isopropanol. The main body content of the ultrapure isopropanol is higher than 99.80, the water content is lower than 10 ppm, the cation content is lower than 0.1 ppb, and the anion content is lower than 50 ppb. The product has the advantages of high purity, low content of metal impurities and stable quality; and the method has high operation continuity and is suitable for industrial production.

Description

technical field [0001] The invention relates to a preparation method of ultra-pure isopropanol, in particular to a preparation method of an ultra-pure organic reagent that meets the requirements of the SEMIC12 standard for chemical materials formulated by the International Semiconductor Equipment and Materials Organization. Background technique [0002] With the rapid development of semiconductor materials, the quality and demand for ultra-clean and high-purity reagents are also rising. In the production process of integrated circuits, ultra-pure reagents can clean and etch the surface of chips and silicon wafers, and do not evaporate after volatilization. Metal, water, organic and mechanical impurities will remain. Ultra-pure isopropanol has been widely used in the production process of semiconductor materials and integrated circuits. Its processing size has gradually entered the era of submicron and deep submicron. The efficiency, electrical performance and reliability hav...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C07C31/10C07C29/74C07C29/88C07C29/80
CPCC25B7/00
Inventor 李川川詹家荣蒋旭亮李海涛
Owner SHANGHAI CHEM REAGENT RES INST
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