Metal-silicon dioxide multilayer film hollow nano structure array and preparation method thereof

Abstract

The invention discloses a metal-silicon dioxide multilayer film hollow nano structure array and a preparation method thereof. The metal-silicon dioxide multilayer film hollow nano structure array comprises a glass substrate, wherein a silicon dioxide film hollow nano structure array and more than one layer of metal film nano structure array are arranged on the surface of the glass substrate sequentially from bottom to top. The preparation method comprises the process steps such as preparation of single-layer ordered polystyrene nanosphere dense arrangement, preparation of single-layer ordered polystyrene nanosphere non-dense arrangement, preparation of a metal nano-pore array mask, preparation of a nano-structure array template, and preparation of a silicon dioxide film hollow nano-structure array and a metal-silicon dioxide multilayer film hollow nano-structure array. The nano-structure array disclosed by the invention has the advantages of large area, high density, good processability and the like; and the preparation method is low in cost and has high efficiency and good compatibility, thereby bringing convenience to the study on the optical properties, magnetic properties, catalytic properties and the like of the nano-structure array.

Description

technical field [0001] The invention belongs to the technical field of nanostructure manufacture, and in particular relates to a metal-silicon dioxide multilayer film hollow nanostructure array and a preparation method thereof. Background technique [0002] Surface plasmon resonance is a special optical property of metal nanostructures, which can make metal nanostructures have special dielectric properties. The electromagnetic field enhancement effect, in principle, makes the light field spatially controllable at the nanoscale, and has great application prospects in surface-enhanced Raman scattering, plasma subwavelength lithography, and solar cells. [0003] Research on the preparation technology of periodic metal nanostructures can controllably adjust the configuration, size, material and matrix parameters of nano-elements, which is conducive to in-depth study of the pathway and mechanism of charge movement and energy transfer on the surface of metal nanostructures. It is...

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Problems solved by technology

Most of these preparation processes have high cost, low manufacturing efficiency, and are limited by the processing method, so it is difficult to realize the controllable preparation of metal-silicon dioxide thin film hollow nanostructure arrays.

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