Method for preparing one-dimensional silicon nanostructure array on surface of optical fiber

Abstract

The invention relates to a method for preparing a one-dimensional silicon nanostructure on the surface of an optical fiber. A polycrystalline silicon thin film with columnar microstructures is chemically etched to obtain a one-dimensional silicon nanostructure array on the surface of the optical fiber. The method comprises the following steps of depositing an amorphous silicon thin film on the surface of a fiber core of a clean quartz optical fiber; annealing the amorphous silicon thin film at a high temperature to obtain the polycrystalline silicon thin film with the columnar microstructures, and separating a part of columnar crystals; chemically etching the polycrystalline silicon thin film by using HF acid in which an H2O2 etchant solution is added so that porous interface layers between the columnar crystals are preferentially etched off to further separate the columnar crystals and reduce the sizes of the columnar crystals, thereby obtaining a silicon nanowire array; performing further etching to separate the columnar crystals from the surface of the optical fiber with a lower-layer tapered nanostructure array left. The preparation method is simple and low in cost; a layered one-dimensional silicon nanostructure array can be prepared, the lengths, diameters, doping types, levels and the like of nanowires can be effectively controlled, the one-dimensional silicon nanostructure array can be prepared on a long-distance optical fiber by coiling the optical fiber or through tubular deposition equipment, and even a roll-to-roll preparation process is allowed.

Description

technical field [0001] The invention relates to a preparation method of a one-dimensional silicon nanostructure, in particular to a preparation method of a tapered nanostructure array on an optical fiber, and belongs to the technical field of nanomaterial preparation and application. Background technique [0002] One-dimensional silicon nanostructures such as silicon nanowires have attracted widespread attention due to their excellent properties and good process compatibility, and have great stress prospects in advanced electronic devices, biological and chemical sensors, optoelectronic devices, and photovoltaic devices. . As a new flexible substrate, optical fibers can extend electronic functions to distances of several meters or even thousands of meters, and can be woven into large two-dimensional or three-dimensional structures. In addition, the use of frustrated total reflection can make the light transmitted in the fiber interact with the structural material directly p...

AI Technical Summary

Problems solved by technology

Due to the special geometric structure of optical fibers, the current conventional nanostructure preparation methods are difficult to directly transfer to optical fibers

Although oblique-angle deposition can fabricate nanorod arrays of different materials on optical fibers, it is difficult to fabricate nanowires with high aspect ratios and nanostructures on long-distance optical fibers.

Images