A dye-sensitized solar cell photoanode and its preparation method and application
A technology for solar cells and dye sensitization, applied in the field of solar cells, can solve the problems of easy cracking of porous films, affecting electron transport, and inability to combine particles, so as to improve photoelectric conversion efficiency, increase reuse efficiency, and increase secondary absorption effect
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Embodiment 1
[0052] A photoanode for a dye-sensitized solar cell, such as figure 1 , is a five-layer laminated structure, which is a conductive substrate 101, a first dense layer 102, a transmission layer 103, a second dense layer 104, and a scattering layer 105 in sequence.
[0053] The conductive substrate 101 is FTO glass; the first dense layer 102 and the second dense layer 104 are a layer of dense TiO 2 membrane;
[0054] The transmission layer 103 is nano-TiO 2 Porous membrane;
[0055] The scattering layer 105 is crystalline TiO 2 diffuser film.
[0056] The film thickness of the transmission layer is 12 μm; the film thickness of the scattering layer is 10 μm.
[0057] Its preparation method is:
[0058] 1) Clean the conductive substrate FTO glass;
[0059] Clean with glass cleaner first, then ultrasonically clean with acetone and ethanol, and finally rinse the conductive substrate with deionized water and dry at 60°C;
[0060] 2) Formation of the first dense layer
[0061]...
Embodiment 2
[0078] A photoanode for a dye-sensitized solar cell, such as figure 1 , is a five-layer laminated structure, which is a conductive substrate 101, a first dense layer 102, a transmission layer 103, a second dense layer 104, and a scattering layer 105 in sequence.
[0079] The conductive substrate 101 is FTO glass; the first dense layer 102 and the second dense layer 104 are a layer of dense TiO 2 membrane;
[0080] The transmission layer 103 is nano-TiO 2 Porous membrane;
[0081] The scattering layer 105 is crystalline TiO 2 diffuser film.
[0082] The film thickness of the transmission layer is 10 μm; the film thickness of the scattering layer is 12 μm.
[0083] Its preparation method is:
[0084] 1) Clean the conductive substrate FTO glass;
[0085] Clean with glass cleaner first, then ultrasonically clean with acetone and ethanol, and finally rinse the conductive substrate with deionized water and dry at 60°C;
[0086] 2) Formation of the first dense layer
[0087]...
Embodiment 3
[0099] A photoanode for a dye-sensitized solar cell, such as figure 1 , is a five-layer laminated structure, which is a conductive substrate 101, a first dense layer 102, a transmission layer 103, a second dense layer 104, and a scattering layer 105 in sequence.
[0100] The conductive substrate 101 is FTO glass; the first dense layer 102 and the second dense layer 104 are a layer of dense TiO 2 membrane;
[0101] The transmission layer 103 is nano-TiO 2 Porous membrane;
[0102] The scattering layer 105 is crystalline TiO 2 diffuser film.
[0103] The film thickness of the transmission layer is 10 μm; the film thickness of the scattering layer is 8 μm.
[0104] Its preparation method is:
[0105] 1) Clean the conductive substrate FTO glass;
[0106] Clean with glass cleaner first, then ultrasonically clean with acetone and ethanol, and finally rinse the conductive substrate with deionized water and dry at 60°C;
[0107] 2) Formation of the first dense layer
[0108] ...
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