Compound cutting tool coating based on titanium diboride and preparation method thereof
A composite tool, titanium diboride technology, applied in the direction of tool, coating, metal material coating process for lathes, etc., to achieve the effects of good toughness, high electrical conductivity, thermal conductivity and electrical conductivity
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[0023] Example 1
[0024] This example provides a composite tool coating based on titanium diboride, which is used to adhere to the substrate 1, and mainly includes TiB 2 -Ni layer 3 and DLC-Ni layer 4, there is a transition layer 2 between the substrate 1 and the composite tool coating. Among them, TiB 2 -Ni layer 3 refers to TiB 2 And Ni composite layer, DLC-Ni layer 4 is a diamond-like carbon and Ni composite layer, which are alternately stacked and have a thickness of nanometer size. As TiB 2 -Ni layer and DLC-Ni layer are alternately stacked, using DLC's high hardness and high conductivity, so that the composite tool coating has the advantages of good toughness, thermal conductivity and electrical conductivity, and its hardness can reach 20GPa.
[0025] In this embodiment, TiB 2 -Ni layer 3 is first attached to the transition layer 2 (metal Ni layer), then DLC-Ni layer 4 and TiB 2 -Ni layers 3 are alternately stacked. TiB 2 -The thickness of the Ni layer 3 and the DLC-Ni laye...
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[0026] Example 2
[0027] This example provides a method for preparing a titanium diboride-based composite tool coating, which specifically includes the following steps:
[0028] (A) Choose commercially available TiB with a purity of 99.9% 2 Ceramic target, commercially available metal Ni target and carbon target with purity of 99.99% are installed on a multi-target magnetron sputtering apparatus as raw materials; (100) oriented single crystal silicon substrate is selected as the substrate, followed by absolute ethanol, acetone, and anhydrous Ethanol ultrasonic cleaning the substrate for 10-20min, then drying at 80℃ for 1-2h and then installing it on the multi-target magnetron sputtering instrument;
[0029] (B) Check that the gas, electricity, and water circuits of the multi-target magnetron sputtering instrument are normal, then turn on the main power supply and start the mechanical pump. When the pressure of the deposition chamber and the sample chamber are below 10 Pa, close the...
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