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Photosensitive resin composition for color filter and color filter using same

A color filter, photosensitive resin technology, applied in the field of color filters, can solve the problems of sensitivity, developability and close contact performance deterioration, reduced sensitivity, developability and close contact performance and other problems

Inactive Publication Date: 2017-10-31
CHEIL IND INC
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0008] In addition, acryl-based resins have good heat resistance, shrinkage resistance, chemical resistance, etc., but have reduced sensitivity, developability, and close contact properties
Sensitivity, developability, and tight contact properties may be significantly deteriorated due to the inclusion of a large amount of black pigment for adjusting the optical density of the light-blocking layer

Method used

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  • Photosensitive resin composition for color filter and color filter using same
  • Photosensitive resin composition for color filter and color filter using same
  • Photosensitive resin composition for color filter and color filter using same

Examples

Experimental program
Comparison scheme
Effect test

preparation Embodiment 1

[0147] Put 462g of bisphenol fluorene epoxy resin (231g / eq epoxy equivalent), 900mg of triethylbenzyl ammonium chloride, 200mg of 2,6-diisobutylbenzene, and 144g of acrylic acid into a 1000ml four-necked flask and heat to 90 to 100°C, while injecting air into it at a rate of 25ml / min. The slightly opaque solution was slowly heated to 120°C to completely dissolve it. Next, the acid value of the solution was measured, and then, heating and stirring were continued until the acid value reached less than 2.0 mgKOH / g. It took 8 hours to bring the acid value to 0.8 mgKOH / g. Then, the solution was cooled to room temperature to obtain a transparent and colorless solid bisphenol fluorene epoxy acrylate. Next, propylene glycol monomethyl ether acetate was added to 152 g of bisphenol fluorene epoxy acrylate and dissolved therein, and 19 g of 1,2,3,6-tetrahydro anhydrous phthalic acid, 36.8 g of biphenyltetracarboxylic dianhydride and 0.5 g of tetraethylammonium bromide were mixed toget...

preparation Embodiment 2

[0155] A cardo-based resin represented by the following Chemical Formula 19 was prepared according to the same method as in Preparation Example 1, except that benzophenone tetracarboxylic dianhydride was used instead of biphenyl tetracarboxylic dianhydride in Preparation Example 1.

[0156] [chemical formula 19]

[0157]

[0158] In chemical formula 19, X 5 and x 6 is independently a linking group represented by the following chemical formula 2, Y 2 is a benzophenone group, Z 5 and Z 6 is independently a linking group represented by the following chemical formula 18, n 2 >0 and m 2 >0.

[0159] The cardo-based resin represented by Chemical Formula 19 had a weight average molecular weight of 4,700 g / mol and a solid acid value of 95 mgKOH / g.

[0160] (Preparation of photopolymerization initiator)

preparation Embodiment 3

[0162] 5 g (25.61 mmol) of ethylcarbazole and 4.32 g (26.89 mmol) of 2-thiopheneacetyl chloride were dissolved in 30 ml of dichloromethane. Cool the solution to 2 °C in an ice bath, then, stir and add 3.41 g (25.61 mmol) of AlCl 3 . The resulting mixture was further stirred at room temperature for 3 hours. Add 4.58g (26.89mmol) of p-methoxybenzoic acid chloride to 20ml of dichloromethane solution, add 4.1g (30.73mmol) of AlCl 3 , and then further stirred for 1 hour and 30 minutes. The resulting reaction solution was cooled in 200 ml of ice, 200 ml of dichloromethane was added thereto, and then, the organic layer was separated therefrom. The obtained organic layer was dried with magnesium sulfate to evaporate the solvent therein to obtain 10 g of a white solid.

[0163] The white solid was mixed with 1.4g (3.59mmol) diketone, 0.261g (3.76mmol) NH 2 OH·HCl and 0.32 g (3.9 mmol) of sodium acetate were mixed in 15 ml of isopropanol, and the mixture was refluxed for 3 hours. ...

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Abstract

The present invention discloses a photosensitive resin composition for a color filter including (A) a binder resin including a cardo-based resin represented by the following Chemical Formula 1, and a color filter using the same; (B) a photopolymerization initiator represented by the following Chemical Formula 14; (C) a photopolymerizable monomer; (E) a colorant; and (F) a solvent. In Chemical Formulas 1 and 14, each substituent is the same as defined in the detailed description. [Chemical formula 1] [Chemical formula 14]

Description

[0001] related application [0002] This application claims priority and benefit from Korean Patent Application No. 10-2012-0145121 filed on December 13, 2012 at the Korean Intellectual Property Office, the entire contents of which are hereby incorporated by reference. technical field [0003] The present disclosure relates to a photosensitive resin composition for a color filter (color filter) and a color filter using the same. Background technique [0004] The liquid crystal display includes: a lower substrate including a light blocking layer, a color filter including the light blocking layer and ITO pixel electrodes; an active circuit part including a liquid crystal layer, a thin film transistor and a capacitor layer; and an upper substrate including an ITO pixel electrode. [0005] The light blocking layer blocks uncontrolled light transmitted outside the transparent pixel electrodes of the substrate, thus preventing contrast reduction (contrast reduction) due to light t...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/032G03F7/004G02B5/20G02B1/04
CPCG03F7/0007G02B5/201G03F7/031G03F7/032G03F7/0388G03F7/105G02B1/04G02B1/041G02B5/20G03F7/004G03F7/0045
Inventor 内河喜代司
Owner CHEIL IND INC