A kind of epitaxial growth method of purple LED
A technology of epitaxial growth and purple light, which is applied in the direction of electrical components, circuits, semiconductor devices, etc., can solve the problems of low luminous efficiency, high manufacturing cost, and low yield of purple light LED chips, achieve good current diffusion, reduce growth difficulty, and improve reliability effect
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[0044] The present invention will be further elaborated below in conjunction with the accompanying drawings.
[0045] The present invention uses sapphire as the growth substrate for heterogeneous epitaxial growth, using metal organic compound chemical vapor deposition (MOCVD) epitaxial growth technology, using trimethylgallium (TMGa), triethylgallium (TEGa), and trimethylindium (TMIn), trimethylaluminum (TMAl) and ammonia (NH3) silane (SiH 4 ) and magnesocene (cp2mg) provide gallium source, indium source, aluminum source, nitrogen source, silicon source and magnesium source for growth respectively. The specific main growth stages are as follows:
[0046] 1. After the sapphire substrate is specially cleaned, put it into the MOCVD equipment and bake it at 1100°C for 10 minutes.
[0047] 2. A low-temperature AlN layer with a thickness of 10 nm is grown at a temperature of 600° C., and the growth pressure is 200 torr.
[0048] 3. Raise the temperature to 1070°C to grow an intri...
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