Method for preparing AZO film

Abstract

The invention provides a method for preparing an AZO film. The method is characterized by comprising the following steps: (1) carrying out magnetron sputtering: in direct-current magnetron sputtering equipment, by adopting an Al2O3 doped ZnO ceramic target as a cathode sputtering target and adopting argon gas as working gas, enabling argon gas to bombard the cathode sputtering target at the working gas pressure of 10<-2> to 10<-1>Pa, carrying out pre-sputtering for 8-10 minutes, taking a quartz substrate as an anode after the process of pre-sputtering is ended, enabling the quartz substrate to automatically rotate at the rate of 3-6r / min, enabling argon gas to bombard the cathode sputtering target, and carrying out magnetron sputtering for 8 minutes, so as to deposit an AZO film on the quartz substrate; (2) etching a grating microstructure: coating the surface of the AZO film with a layer of photoresist, covering the surface of the photoresist with a grating mask plate, exposing the photoresist, developing the photoresist with a developing solution, and forming grating grooves in the surface of the AZO film through etching by adopting an argon ion beam etching technology.

Description

technical field [0001] The present invention relates to the preparation of AZO thin films, in particular to a preparation method of AZO thin films with tunable optical bandgap, Background technique [0002] In recent years, ZnO transparent conductive films have been extensively studied. ZnO thin films compared to ITO and SnO 2 However, it has the advantages of cheap price, relatively low deposition temperature and better stability in hydrogen atmosphere. As an important optoelectronic information material, the excellent photoelectric properties of aluminum-doped zinc oxide (AZO) transparent conductive film make it widely used in solar cells, liquid crystal displays, thermal mirrors and other fields. [0003] At present, there are many methods for preparing AZO thin films, including sol-gel method, chemical vapor deposition method, electron beam evaporation method, pulsed laser method and magnetron sputtering method. With the wide application of AZO, optimizing the optical...

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Problems solved by technology

[0004] In the existing technology, doping is usually used to adjust the optical band gap of the film before coating to improve the optical properties of the film. Different targets need to be prepared according to the doping process, but the production cost is high, and it is difficult to popularize and use it on a large scale.

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