Water-based diamond polishing solution used for crystal processing

A diamond and polishing fluid technology, applied in the field of precision polishing, can solve problems such as polluted environment, strong acidity and alkalinity, and unfavorable environmental protection

Active Publication Date: 2014-09-10
TIANJIN CHANYU SUPERHARD SCI TECH CO LTD
View PDF5 Cites 41 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] CN1100104C is a diamond oil-based polishing fluid with high cost, low polishing efficiency and difficult cleaning
[0004] The pH of the polishing solution described in CN1560161A is 2 to 12, with strong acidity and alkalinity, which corrodes parts and is unfavorable for environmental protection
[0005] The optimum Ra of US20100233880 polished surface is 0.5nm, which cannot meet higher requirements
[0006] CN1940003A Diamond should be placed in concentrated sulfuric acid, ultrasonically sheared, and then heated in concentrated sulfuric acid at 200-300°C for 1 to 3 hours, which will seriously corrode the equipment and pollute the environment
[0008] Wu Renhe and others (Tool Technology 2006 (1) 18-20) only use medium-sized nano-diamonds to make polishing fluids, because they are not easy to make when using fine-grained nano-diamonds

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0031] It is planned to prepare 10 kg of single crystal diamond polishing liquid with a particle size of 1 um and a concentration of 1.0%.

[0032] Take by weighing 1um single crystal diamond micropowder 100g manufactured by the static pressure catalyst method, add 500g of 5% glycerol solution (wetting agent) made with deionized water, fully roll and stir with a plastic rod, until all The micropowder is soaked. Then add 6.09 kg of 0.5% glycerol solution (surfactant and lubricant), stir evenly, and ultrasonicate for 5 minutes to prepare sample A1.

[0033] Add 100 g of filtered 3% sodium hexametaphosphate aqueous solution (surfactant) into sample A1, stir evenly to prepare sample A2.

[0034] Add 200 g of filtered 5% potassium sorbate aqueous solution (antiseptic and bactericide) into sample A2, stir to make sample A3.

[0035] Add 10 g of 1% oleic acid aqueous solution (defoamer) into sample A3, stir evenly to prepare sample A4.

[0036] Add 2500 g of 2% xanthan gum aqueous...

Embodiment 2

[0043] It is planned to prepare 10 kg of single crystal nano-diamond polishing fluid with a particle size of 5 nm and a concentration of 0.2%.

[0044] Take by weighing 20g of 5nm single crystal nano-diamonds made by detonation method, add 500g of 5% polyethylene glycol solution (wetting agent) made with deionized water, fully roll and stir with plastic rods, until all The nanopowder is soaked. Then add 6.27 kg of 0.5% polyethylene glycol solution (surfactant and lubricant), stir evenly, and ultrasonically treat for 5 minutes to prepare sample B1.

[0045]Add 200 g of filtered 10% sodium dodecylbenzenesulfonate aqueous solution (surfactant) into sample B1, stir evenly to prepare sample B2.

[0046] Add 200 g of filtered 10% sodium nitrite aqueous solution (rust preventive and anticorrosion bactericide) into sample B2, stir evenly to prepare sample B3.

[0047] Add 10 g of 1% emulsified simethicone aqueous solution (defoamer) into sample B3, stir evenly to prepare sample B4. ...

Embodiment 3

[0055] It is planned to prepare 10 kg of polycrystalline nano-diamond polishing fluid with a particle size of 0.125 um and a concentration of 0.5%.

[0056] Take by weighing 0.125um polycrystalline nano-diamond nanopowder 50g manufactured by explosion method, add 500g of 5% ethylene glycol solution (wetting agent) made with deionized water, fully roll and stir with a plastic rod, until All the nanopowders are drenched. Then add 6.14 kg of 0.5% ethylene glycol solution (lubricant), stir well, and ultrasonically treat for 5 minutes to prepare sample C1. Ethylene glycol helps to disperse and suspend nanodiamonds.

[0057] Add 600 g of polyethylene glycol (surfactant and lubricant) into sample C1, stir evenly to prepare sample C2.

[0058] Add 200 g of 10% sodium dehydroacetate aqueous solution (preservative and bactericide) into sample C2, stir evenly to prepare sample C3.

[0059] Add 10g of ethanol (defoamer) into sample C3, stir evenly to make sample C4.

[0060] Add 2,500...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

PropertyMeasurementUnit
particle sizeaaaaaaaaaa
surface roughnessaaaaaaaaaa
surface roughnessaaaaaaaaaa
Login to view more

Abstract

The invention provides a method for preparing multi-granularity water-based diamond polishing liquid used for crystal processing. The polishing solution is suitable for polishing a variety of crystals. A high shear emulsifying machine is used, the diameter of the stirring work head of the machine is not less than 56mm, and the maximum rotating speed of the stirring work head is not lower than 15000rpm; and a viscosity modifier is used to prepare the polishing solution with different viscosities in order to meet the different needs of many users. The polishing solution obtained in the invention has the polishing, lubricating, cooling and chip removing functions. The ingredients of the polishing solution comprise water, diamond, a wetting agent, a surfactant, the viscosity modifier, an antirust agent, a lubricating agent, an antifoaming agent, an antiseptic bactericide and a pH regulator. When the 1mum monocrystalline diamond polishing solution is used to polish SiC crystals, the polishing efficiency reaches 0.08mum / min, and the surface roughness Ra of the SiC crystals decrease to 0.91nm from original 80nm after polishing; and when a 0.125mum polycrystalline nano-diamond polishing solution is used to polish the SiC crystals, the surface roughness Ra of the SiC crystals reaches 0.1-0.3nm.

Description

technical field [0001] The invention belongs to the field of precision polishing, and is specially designed for a water-based diamond polishing fluid for crystal processing. Background technique [0002] Polishing fluid is a key element in crystal polishing technology, and its performance directly affects the surface quality after polishing. With the rapid development of precision machining, diamond polishing fluid has developed rapidly in recent years. Compared with many ordinary abrasive polishing fluids, the polishing efficiency of diamond polishing fluid is several times to dozens of times higher, and the surface roughness is significantly reduced. It can not only polish a variety of hard and brittle crystal materials that are difficult to process, but also has unique features in polishing soft crystals. For example: SiC, Al 2 o 3 , Si, SiO 2 , CaF 2 、BeF 2 , Li 3 AlO 3 , Li 3 GaO 3 , Tb 3 GaO 12 、GeO 2 、Si 3 N 4 , ZrO 2 Various crystal workpieces such a...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): C09G1/02
Inventor 张书达张文刚
Owner TIANJIN CHANYU SUPERHARD SCI TECH CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap