Preparation method of carbon nanotube/manganese dioxide hybridization supercapacitor electrode material
A technology of supercapacitors and carbon nanotubes, which is applied in the manufacture of hybrid capacitor electrodes and hybrid/electric double-layer capacitors, etc., can solve the problems of high rate charge-discharge performance and poor cycle performance, affecting capacitor capacity and rate performance, and high areal density. problems such as insertion and extraction, to achieve the effect of excellent cycle performance, high energy density, and high power density
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[0049] A preparation method of carbon nanotube / manganese dioxide hybrid supercapacitor electrode material, comprising the following steps:
[0050] (1) Remove organic impurities from the flexible carbon cloth after removing inorganic impurities;
[0051] (2) deposit a layer of Ni film with a thickness of 5-20nm on the carbon cloth by physical evaporation;
[0052] (3) arranging the carbon after the impurity removal in step (1) into a carbon nanotube PECVD growth furnace, and annealing and spheroidizing the Ni film;
[0053] (4) Cool down to 680-750°C and pass into C at a rate of 40-80Sccm 2 H 4 , start the plasma power supply to keep the power at 50-90W, and carry out the orderly growth of carbon nanotubes; the pressure in the growth furnace chamber is the same as the pressure during annealing and spheroidization; the growth time is 15min-60min;
[0054] (5) arrange the carbon with the tube grown in step (4) into the reactor, add 0.05-0.15mol / L potassium permanganate soluti...
Embodiment 1
[0060] (1) Soak a 5cm×5cm flexible carbon cloth with 100 ml of 4mol / L nitric acid solution for 1 hour, and then rinse with a large amount of deionized water to remove inorganic impurities; the carbon cloth treated with nitric acid was treated with acetone and alcohol for 4 Ultrasonic cleaning to remove organic impurities, cleaned carbon fibers such as figure 2 shown;
[0061] (2) deposit a layer of 10-nanometer Ni film on the carbon cloth by electron beam evaporation by physical evaporation, as a catalyst for growing carbon nanotubes;
[0062] (3) Arranging the carbon into the carbon nanotube PECVD growth furnace, feeding 200 ccm of ammonia gas, the pressure is 20 mbar, heating up to 750 ° C, holding for 10 min, and annealing the Ni film;
[0063] (4) Cool down to 720°C, pass 60Sccm of C 2 H 4 , start the plasma power, keep the power at 70W, generate plasma in the cavity, keep the cavity pressure still 20mbar, and carry out the orderly growth of carbon nanotubes, the growt...
Embodiment 2
[0069] (1) Soak a 5cm×5cm flexible carbon cloth with 100 ml of 2M nitric acid solution for 2 hours, and then rinse with a large amount of deionized water to remove inorganic impurities; the carbon cloth treated with nitric acid is treated with acetone and alcohol for 5 times. Ultrasonic cleaning to remove organic impurities;
[0070] (2) deposit a layer of 8-nanometer Ni thin film on the carbon cloth by magnetron sputtering by physical evaporation, as a catalyst for growing carbon nanotubes;
[0071] (3) Arrange the carbon into a PECVD growth furnace such as carbon nanotubes, pass in 250 ccm of ammonia gas, the pressure is 25 mbar, heat up to 730 ° C, hold for 12 min, and anneal and spheroidize the Ni film;
[0072] (4) Cool down to 680°C, pass 45Sccm of C 2 H 4 , start the plasma power supply, keep the power at 50W, generate plasma in the cavity, keep the cavity pressure still at 25mbar, and carry out the orderly growth of carbon nanotubes, and the growth time is 60min;
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