Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Mineralized collagen based skull repairing device and manufacturing method thereof

A technology of mineralizing collagen and skull, applied in bone implants, medical science, prostheses, etc., can solve the problems of insufficient repair of skull defects, limited strength and toughness, etc., and achieve good osteogenic activity and material The effect of uniform distribution, good elasticity and toughness

Active Publication Date: 2015-01-07
BEIJING ALLGENS MEDICAL SCI & TECH
View PDF6 Cites 6 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, MC itself has limited strength and toughness, and its use alone cannot well meet the requirements of skull defect repair.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Mineralized collagen based skull repairing device and manufacturing method thereof
  • Mineralized collagen based skull repairing device and manufacturing method thereof
  • Mineralized collagen based skull repairing device and manufacturing method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0048] Example 1, preparing a mineralized collagen-based cranioplasty device in which the diameter of the bottom surface of the "cap" is 16 mm and the diameter of the cross-section of the "plug" is 10 mm.

[0049] figure 1 Shown is a schematic view of the longitudinal section structure of the mineralized collagen-based skull repair device of this embodiment passing through the central axis, figure 2 Shown is a top view of the mineralized collagen-based skull repair device of this embodiment. where the diameter of the base of the "cap" D 1 Designed to be 16 mm, the cross-sectional diameter of the "plug" D 2 Designed to be 10 mm, the height of the "cap" H 1 Designed to be 2 mm, the height of the "plug" H 2 Designed to be 4 mm, the overall height of the device H The design is 6 mm, the number of fixing holes on the peripheral eaves is 4, and the diameter of the fixing holes is d Designed to be 1 mm from the center of the hole to the edge of the "cap" D h Designed to ...

Embodiment 2

[0072] Example 2, preparing a mineralized collagen-based skull repair device with a bottom diameter of the "cap" of 33 mm, a cross-sectional diameter of the "plug" of 23 mm, and a through hole with a diameter of 3.5 mm in the center.

[0073] Figure 6 Shown is the front view of the mineralized collagen-based skull repair device of this embodiment. where the diameter of the base of the "cap" D 1 Designed to be 33 mm, the cross-sectional diameter of the "plug" D 2 Designed to be 23 mm, the diameter of the central cylindrical through hole D 3 Designed to be 3.5 mm, the height of the "cap" H 1 Designed for 3 mm, "plug" height H 2 Designed to be 4 mm, the overall height of the device H The design is 7 mm, the number of fixing holes on the peripheral eaves is 8, and the diameter of the fixing holes is d Designed to be 1 mm from the center of the hole to the edge of the "cap" D h Designed to be 2.5mm.

[0074] The preparation method of the mineralized collagen-based sk...

Embodiment 3

[0093] Example 3, preparing a mineralized collagen-based cranioplasty device in which the diameter of the bottom surface of the "cap" is 14.5 mm and the cross-sectional diameter of the "plug" is 8.5 mm.

[0094] where the diameter of the base of the "cap" D 1 Designed to be 14.5 mm, the cross-sectional diameter of the "plug" D 2 Designed to be 8.5 mm, the height of the "cap" H 1 Designed to be 1.8 mm, the height of the "plug" H 2 Designed to be 5 mm, the overall height of the device H The design is 6.8 mm, and there are no fixing holes on the peripheral eaves.

[0095] The preparation method of the mineralized collagen-based skull repair device of this embodiment includes:

[0096] Step S1, preparation of the mineralized collagen composite material, specifically includes:

[0097] Step S1-1, dissolving collagen in 0.1 mol / L hydrochloric acid solution to prepare an acid solution of collagen, wherein the concentration of collagen is 1.0 × 10 -3 g / mL;

[0098] Step S1...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
densityaaaaaaaaaa
pore sizeaaaaaaaaaa
diameteraaaaaaaaaa
Login to View More

Abstract

The invention relates to a mineralized collagen based skull repairing device and a manufacturing method thereof. The mineralized collagen based skull repairing device is made of a mineralized collagen / PCL (polycaprolactone) composite material; and the appearance of the repairing device comprises a spherical segment cap at the upper part and a cylindrical plug at the lower part. A separation mold and a secondary pouring technology are adopted during preparation of the mineralized collagen based skull repairing device, and the product defect caused by air residue at the blind end of the mold is overcome. The skull repairing device made of the mineralized collagen / PCL composite material has excellent osteogenic activity, the material is gradually and passively degraded under the creeping substitution action of cells, and growth of new bones can be guided at the skull defect part. A degradation product of the composite material is neutral, acidic materials causing aseptic inflammation cannot be generated, and new bone formation isn't affected; and through composition of PCL, the skull repairing device has excellent elasticity and toughness besides enough crush resistance and bending strength, and the repairing requirement of a skull of a human body is met.

Description

technical field [0001] The invention relates to the field of biomedical materials, in particular to a skull repair device using mineralized collagen as a base material, and a manufacturing method of the device. Background technique [0002] Skull defect is a common symptom in neurosurgery, most of which are caused by open craniocerebral injury or gunshot penetrating injury, and some patients have residual bone defect due to surgical decompression or craniotomy of diseased patients. [0003] Currently used cranioplasty materials mainly include natural biomass materials and artificial synthetic materials. Natural biomass materials are derived from autologous bone, allogeneic bone, and allogeneic bone. Due to their limitations in material extraction, immune rejection, and risk of infection, they are limited to "filling" transplants for small skull defects. [0004] For large-area defects of the skull, artificial synthetic materials are mainly used for repair. At present, "cov...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): A61L27/46A61L27/18A61F2/28
Inventor 黄晚兰仇志烨张自强
Owner BEIJING ALLGENS MEDICAL SCI & TECH
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com