Efficient laminated thin film solar cell and preparing method thereof
A thin-film solar cell, stacking technology, applied in circuits, photovoltaic power generation, electrical components, etc., can solve the problems of incompatibility, low conversion efficiency, light-induced degradation, etc.
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[0013] 1. Preparation of TCO glass
[0014] Using glass as the substrate, after ultrasonic cleaning with acetone, absolute ethanol, and deionized water for 10 minutes, use high-purity (purity 99.999%) N 2 Blow dry; use the magnetron sputtering coating system to co-sputter ZnO:Al film on the glass plate, the background vacuum of the sputtering system is 6.0×10 -4 pa, the working pressure is 1.5~2.0pa, the sputtering thickness is 90~110nm, and the Al content is 12%~25%. 2 Perform rapid annealing on the ZnO:Al thin film under the atmosphere, the annealing temperature is 350°C, and the time is 20-25min.
[0015] 2. Preparation of PIN junction silicon-based thin film
[0016] Using four-chamber cluster or three-chamber linear plasma-enhanced vapor-phase chemical deposition (PECVD) coating system, using TCO glass as the substrate, the system background vacuum is 6×10 -3 Pa;
[0017] For the preparation of p-type silicon thin films, the TCO glass substrate was placed in a p-type ...
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