Method for manufacturing thin film capacitor with anodic oxidation film as dielectric layer
An anodized film, film capacitor technology, applied in capacitor manufacturing, capacitors, circuits, etc., can solve the problems of complex production process of air bridge, complex equipment and process, poor film compactness, etc., to achieve capacitance value and withstand voltage value The effect of easy adjustment of size, good electrical properties, and low manufacturing cost
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[0056] Example one:
[0057] On a sapphire substrate 1 with a thickness of 0.254 mm, a Ta film is deposited as a metal film 2 by magnetron sputtering. The thickness of the Ta film is about 300 nm, such as figure 1 Shown.
[0058] The metal thin film 2 is patterned by a photolithography etching process to form a lower electrode 202 and a first lower electrode lead line 201, such as figure 2 Shown. Among them, Ta etchant uses HF buffer.
[0059] A photoresist is spin-coated on the lower electrode 202 and the first lower electrode lead-out line 201, and an anodic oxidation mask is formed through a photolithography process. The thickness of the patterned anodic oxidation mask 3 is 8 microns. The anodizing mask 3 completely covers the first lower electrode lead-out line 201 to prevent the first lower electrode lead-out line 201 from being oxidized during anodization. The opening area of the anodizing mask 3 is larger than that of the lower electrode 202, so that the side surface of t...
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