A kind of preparation method of LED light emitting unit
A light-emitting unit, LED chip technology, applied in electrical components, circuits, semiconductor devices, etc., can solve the problems of unequal flip chip size, uneven stress distribution, high positioning accuracy requirements, and achieve small interlayer mismatch, internal Low stress and small volume effect
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Embodiment 1
[0042] figure 1 It is a flow chart of the method for preparing the LED light emitting unit in Embodiment 1 of the present invention.
[0043] The preparation method of the LED light-emitting unit in this embodiment specifically includes the following steps:
[0044] S01. Growth of diamond-like carbon film
[0045] Such as figure 2 As shown, the sapphire substrate 1 was ultrasonically cleaned in acetone solution for 15 minutes, and dried in an oven at 85°C. Using chemical vapor deposition equipment, a diamond-like film was grown on the sapphire substrate 1 in an Ar gas atmosphere. 2. The thickness is greater than 4 μm.
[0046] S02, preparing electrode through holes, such as image 3 As shown, the plasma etching method is used to prepare electrode through holes 21 on the diamond-like carbon film 2 formed in step S01.
[0047] S03, patterned electrode preparation, such as Figure 4As shown, utilize optical card, electronic book vapor deposition (EBM) technology to prepare...
Embodiment 2
[0062] The difference from Example 1 is that the preparation method of the LED light-emitting unit of this example, such as Figure 12 As shown, in step S07, the wafer is bonded to the diamond-like film sapphire substrate with double-sided electrodes, and then the next step of splitting is performed, that is, the wafer between the through holes of adjacent electrodes is split, and the thin film 2 split, and all the other steps are the same as those in Example 1, and will not be repeated here.
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Abstract
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