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A kind of preparation method of LED light emitting unit

A light-emitting unit, LED chip technology, applied in electrical components, circuits, semiconductor devices, etc., can solve the problems of unequal flip chip size, uneven stress distribution, high positioning accuracy requirements, and achieve small interlayer mismatch, internal Low stress and small volume effect

Active Publication Date: 2017-05-31
FOSHAN NATIONSTAR OPTOELECTRONICS CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, this technical solution will result in different sizes of flip-chip p and n electrodes, and the p electrode is about 1 / 7 of the n-type electrode.
On the one hand, the small electrode size requires high positioning accuracy for die placement. On the other hand, due to the different eutectic welding areas, the stress distribution is uneven, which is more likely to cause stress failure and damage.
3. At present, flip-chip LED chips must rely on the packaging process to carry out practical lighting applications. The packaging substrate material is usually alumina ceramics. Although the alumina ceramic substrate has good insulation, the thermal conductivity is still very low (about 10W / m ·K)
At the same time, due to the brittleness of the ceramic itself, the substrate is thicker, usually more than 0.5mm, which further restricts the heat dissipation of the chip

Method used

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  • A kind of preparation method of LED light emitting unit
  • A kind of preparation method of LED light emitting unit
  • A kind of preparation method of LED light emitting unit

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0042] figure 1 It is a flow chart of the method for preparing the LED light emitting unit in Embodiment 1 of the present invention.

[0043] The preparation method of the LED light-emitting unit in this embodiment specifically includes the following steps:

[0044] S01. Growth of diamond-like carbon film

[0045] Such as figure 2 As shown, the sapphire substrate 1 was ultrasonically cleaned in acetone solution for 15 minutes, and dried in an oven at 85°C. Using chemical vapor deposition equipment, a diamond-like film was grown on the sapphire substrate 1 in an Ar gas atmosphere. 2. The thickness is greater than 4 μm.

[0046] S02, preparing electrode through holes, such as image 3 As shown, the plasma etching method is used to prepare electrode through holes 21 on the diamond-like carbon film 2 formed in step S01.

[0047] S03, patterned electrode preparation, such as Figure 4As shown, utilize optical card, electronic book vapor deposition (EBM) technology to prepare...

Embodiment 2

[0062] The difference from Example 1 is that the preparation method of the LED light-emitting unit of this example, such as Figure 12 As shown, in step S07, the wafer is bonded to the diamond-like film sapphire substrate with double-sided electrodes, and then the next step of splitting is performed, that is, the wafer between the through holes of adjacent electrodes is split, and the thin film 2 split, and all the other steps are the same as those in Example 1, and will not be repeated here.

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Abstract

The invention discloses a preparation method of an LED (light emitting diode) luminous unit. The preparation method comprises the following steps that (1) a layer of diamond-like thin film grows on a sapphire substrate; (2) electrode through holes are prepared in the diamond-like thin film; (3) an electrode through hole array is prepared on one exposed side of the diamond-like thin film, meanwhile, a layer of metal is electroplated on the inner wall of each electrode through hole, and in addition, bonding metal is prepared at the electrode through hole part electroplated with the metal; (4) a base plate with ultraviolet adhesive is prepared, and the diamond-like thin film is pasted with the ultraviolet adhesive of the base plate; (5) the sapphire substrate and the diamond-like thin film are peeled from a border of the sapphire substrate and the diamond-like thin film in a laser peeling mode; (6) a metal pattern array is prepared at the other side of the diamond-like thin film, and meanwhile, the metal is electroplated at the bottom of each electrode through hole; (7) LED chip or wafer bonding is then carried out; (8) then, the splinter cutting is carried out, and ultraviolet light is utilized for irradiation at the bottom, so that the ultraviolet adhesive loses the viscidity, and the base plate is separated.

Description

technical field [0001] The invention relates to the technical field of manufacturing a flip-chip LED chip, in particular to a method for preparing an LED light-emitting unit. Background technique [0002] With the development of LED lighting technology, the requirements of LED lighting for LED chips are becoming more and more stringent. Usually for high-power lighting applications, the driving power of a single LED chip needs to be above 3W or even higher to obtain a higher light output. Under this power characteristic, the LED chip heats up very seriously. The gold wire package used in traditional front-mounted chips is It is difficult to withstand the stress impact caused by the thermal expansion of the material under such a high current density and heat flux. Flip-chip LED chip is a new LED chip technology in recent years. Because of the structural characteristics that the electrodes are located at the bottom of the chip and the light-emitting surface is located at the t...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L33/62H01L33/48
CPCH01L33/005H01L33/48H01L33/62H01L2933/0033
Inventor 丁鑫锐李宏浩李宗涛吴灿标
Owner FOSHAN NATIONSTAR OPTOELECTRONICS CO LTD