Spectroscopic ellipsometry real-time monitoring preparation method of nano-silicon thin film solar cells
A nano-silicon thin film and solar cell technology, which is applied in circuits, photovoltaic power generation, electrical components, etc., can solve the problem that there is no real-time monitoring and preparation method of nano-silicon thin film solar cell ellipsoidal polarization spectrum.
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Embodiment 1
[0094] A preparation method for real-time monitoring of the ellipsoidal polarization spectrum of a nano-silicon thin film photovoltaic cell according to the present invention comprises the following steps:
[0095] Step 1: After cleaning the P-type silicon wafer with the conventional silicon wafer cleaning process, that is, the improved RCA cleaning process, put it in a polytetrafluoroethylene container and use a dilute solution of HF: deionized water = 1:50 to etch the very short time, about 10 seconds and then rinse the HF acid with a large amount of deionized water within 30 seconds to remove the silicon dioxide layer on the single crystal silicon wafer. The method of chemical etching with alkaline solution is to use NaOH as a reactant and isopropanol as an additive to adjust the anisotropy factor of the corrosion rate. The mixed solution of NaOH and isopropanol is used for anisotropic etching of single crystal silicon. The NaOH concentration is 3 %, the amount of isopropan...
Embodiment 2
[0107] A preparation method for real-time monitoring of the ellipsoidal polarization spectrum of a nano-silicon thin film photovoltaic cell according to the present invention comprises the following steps:
[0108] Step 1: After cleaning the N-type silicon wafer with the conventional silicon wafer cleaning process, that is, the improved RCA cleaning process, put it in a polytetrafluoroethylene container and use a dilute solution of HF: deionized water = 1:50 to etch the very short time, about 10 seconds and then rinse the HF acid with a large amount of deionized water within 30 seconds to remove the silicon dioxide layer on the single crystal silicon wafer. The method of chemical etching with alkaline solution is to use NaOH as a reactant and isopropanol as an additive to adjust the anisotropy factor of the corrosion rate. The mixed solution of NaOH and isopropanol is used for anisotropic etching of single crystal silicon. The NaOH concentration is 3 %, the amount of isopropan...
Embodiment 3
[0120] A preparation method for real-time monitoring of the ellipsoidal polarization spectrum of a nano-silicon thin film photovoltaic cell according to the present invention comprises the following steps:
[0121] Step 1: After cleaning the P-type silicon wafer with the conventional silicon wafer cleaning process, that is, the improved RCA cleaning process, put it in a polytetrafluoroethylene container and use a dilute solution of HF: deionized water = 1:50 to etch the very short time, about 10 seconds and then rinse the HF acid with a large amount of deionized water within 30 seconds to remove the silicon dioxide layer on the single crystal silicon wafer. The method of chemical etching with alkaline solution is to use NaOH as a reactant and isopropanol as an additive to adjust the anisotropy factor of the corrosion rate. The mixed solution of NaOH and isopropanol is used for anisotropic etching of single crystal silicon. The NaOH concentration is 3 %, the amount of isopropan...
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