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A method for treating chlorosilane slag by extraction method

A technology of chlorosilane and extraction method, which is applied in the field of chlorosilane slag treatment by extraction method, can solve the problems of large industrial sewage, achieve the effects of less industrial waste, improve recycling, and avoid environmental pollution

Active Publication Date: 2017-12-19
李金金
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

But both can only recover the silicon tetrachloride and trichlorosilane in the chlorosilane slurry, and the waste residue hydrolysis process requires a large amount of alkaline water for neutralization due to the residual liquid phase materials, and produces a large amount of industrial sewage

Method used

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  • A method for treating chlorosilane slag by extraction method
  • A method for treating chlorosilane slag by extraction method
  • A method for treating chlorosilane slag by extraction method

Examples

Experimental program
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Effect test

Embodiment 1

[0062] The extraction agent in the description of the technological process selects n-tridecane, the mass ratio of the extraction agent and the chlorosilane slurry is 50:1000, the drying temperature of the blade dryer is 85°C, the pressure is 0.015Mpa, and the high-boiling substance evaporation tank is evaporated. The temperature is 170° C., the pressure is 0.015Mpa, and the solid dry slag is pickled with dilute hydrochloric acid. The concentration and mass fraction of dilute hydrochloric acid are 1%.

Embodiment 2

[0064] The extraction agent in the description of the technological process selects n-tridecane, the mass ratio of the extraction agent and the chlorosilane slurry is 50:1000, the drying temperature of the blade dryer is 85°C, the pressure is 0.015Mpa, and the high-boiling substance evaporation tank is evaporated. The temperature is 170°C, the pressure is 0.015Mpa, and the solid dry residue is pickled with dilute hydrochloric acid, the concentration of the dilute hydrochloric acid is 0.25%, and the mass ratio of the amount of dilute hydrochloric acid to the solid dry residue is 20:1.

Embodiment 3

[0066] The extraction agent in the description of the technological process selects n-tridecane, the mass ratio of the extraction agent and the chlorosilane slurry is 50:1000, the drying temperature of the blade dryer is 85°C, the pressure is 0.015Mpa, and the high-boiling substance evaporation tank is evaporated. The temperature was 170° C., the pressure was 0.015Mpa, and the solid dry residue was pickled with dilute hydrochloric acid. The concentration and mass fraction of the dilute hydrochloric acid were 10%.

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Abstract

The invention provides a method for treating chlorosilane slurry by extraction, which comprises the following steps: step 1, chlorosilane slurry and extractant enter a static mixer and mix uniformly to obtain a mixture; step 2, the mixture described in step 1 enters the paddle Leaves are dried by a leaf dryer, and silicon tetrachloride and trichlorosilane are separated and recovered; in step 3, the remaining slurry in step 2 is evaporated in a high boiler evaporation tank, and crude hexachlorodisilane is separated and recovered, which can be further refined Distillation and purification; step 4, the remaining slurry in step 3 enters the dry distillation tower for dry distillation, separates aluminum trichloride and recycles; step 5, carries out dry distillation on the basis of step 4, separates the extractant and recycles; step 6, in step 4 Carry out dry distillation on the basis of five, separate and recover ferric chloride, and obtain the remaining solid; step seven, the remaining solid in step six enters the pickling tank for pickling, and obtains a slurry; step eight, the slurry obtained in step seven enters the baking powder Oven drying, recovery of industrial silicon powder.

Description

technical field [0001] The invention belongs to the technical field of silicon material production, including the technical field of polysilicon and organic silicon production, and particularly relates to a method for treating chlorosilane slurry by an extraction method. Background technique [0002] Polysilicon is the main raw material required by the electronic semiconductor industry and the solar photovoltaic industry, and is a strategic material necessary for the development of my country's electronic hardware industry and solar photovoltaic industry. At present, the modified Siemens method is still the dominant technology for producing low-cost polysilicon in the world. At present, the competition between the various processes of the Siemens improvement method is mainly divided into four aspects: (1) improving the recycling and utilization of by-products in the production process of the Siemens improvement method; (2) improving the recovery and utilization of heat energ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C01B33/107C01B33/02
Inventor 李金金
Owner 李金金