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Preparation method of epitaxial lanthanum strontium cobalt oxide film based on radio-frequency reactive sputtering

A technology of lanthanum strontium cobalt oxide and magnetron sputtering coating, which is applied in the field of radio frequency reactive sputtering epitaxial lanthanum strontium cobalt oxide thin film preparation, can solve the problems of few thin film reports, high cost, harshness, etc., and achieve simple doping method Fast, high target utilization rate, avoiding the effect of impurity phase formation

Inactive Publication Date: 2015-03-11
TIANJIN UNIV
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Problems solved by technology

Thanks to La 1-x Sr x CoO 3 The conditions for thin film preparation are very harsh, and the requirements for preparation temperature, oxygen partial pressure, annealing and post-processing are relatively high, and the preparation of epitaxial La 1-x Sr x CoO 3 There are few reports on thin films, and epitaxial La 1-x Sr x CoO 3 Molecular beam epitaxy and pulsed laser deposition are often chosen for thin films in order to obtain epitaxial thin films with high crystalline quality. However, due to the shortcomings of these preparation methods such as time-consuming and high cost, they cannot meet the needs of industrial mass production. Therefore, it is time-consuming to find a Short, low-cost, high-quality, high-efficiency preparation methods have become a very urgent need

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Embodiment Construction

[0035] According to our structural and magnetic analysis of the samples prepared in the present invention, the adjustable three-target RF reactive sputtering epitaxial perovskite La 1-x Sr x CoO 3 The best implementation mode of thin film preparation method is described in detail:

[0036] The adjustable three-target reactive sputtering epitaxial lanthanum strontium cobalt oxide thin film equipment of the present invention adopts the KPS-450 adjustable three-target ultra-high vacuum magnetron sputtering coating equipment produced by the Shenyang Scientific Instrument Development Center of the Chinese Academy of Sciences. The characteristic steps of its method of operation are as follows:

[0037] 1. Install a piece of La with a purity of 99.99% on one of the targets of the coating machine 0.67 Sr 0.33 CoO 3 Target, and adjust the target surface to the direction parallel to the horizontal plane, the thickness of the target is 4-6mm, and the diameter is 60mm. in la 0.67 S...

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Abstract

The invention relates to a preparation method of an epitaxial lanthanum strontium cobalt oxide film based on radio-frequency reactive sputtering. A radio-frequency reactive magnetron sputtering technology is adopted, and factors such as sputtering power, sputtering air pressure, the flow ratio of argon to oxygen and the temperature of a substrate are taken into comprehensive consideration in the sputtering process. According to the method, the importance of post-annealing is specially emphasized, sufficient oxygen is needed in the preparation process of La(1-x)SrxCoO3 film to avoid influence on the related physical characteristics of the film caused by forming of an oxygen vacancy, the defects such as the oxygen vacancy can be overcome by the post-annealing, and the surface of the film can be smoother. The preparation method of the epitaxial La(1-x)SrxCoO3 film has the advantages of compatibility with conventional industrial production, convenience in doping, simplicity in regulation of the concentration of a doped Sr element, simplicity in selection of a target material, higher utilization rate of the target material and the like, and is widely applicable to the preparation of related spintronics devices.

Description

technical field [0001] The patent of the present invention relates to a kind of equipment and operation method for preparing epitaxial lanthanum strontium cobalt oxygen film by reactive sputtering, more specifically, it is a radio frequency reactive sputtering epitaxial lanthanum strontium cobalt oxide compatible with existing industrial production and simple target material selection Preparation method of oxygen thin film Background technique [0002] As early as 1993 and 1994, Helmolt and Jin et al. successively doped perovskite manganese oxide La 2 / 3 Ba 1 / 3 MnO 3 and La 2 / 3 Ca 1 / 3 MnO 3 Colossal magnetoresistance (CMR) was found in (S.Jin, et al, Science, 1994, 264, 431). In 2004 a research group in La 0.84 Sr 0.16 MnO 3 The giant planar Hall effect was discovered in (Y.Bason, et al, Appl.Phys.Lett., 2004, 84, 2593), which is another major breakthrough in the field of anisotropic magnetic transport research, and it is speculated that A similar giant planar Hall ...

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Application Information

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IPC IPC(8): C23C14/35C23C14/06
CPCC23C14/0036C23C14/06C23C14/35
Inventor 崔文瑶李鹏白海力
Owner TIANJIN UNIV
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