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34 results about "Colossal magnetoresistance" patented technology

Colossal magnetoresistance (CMR) is a property of some materials, mostly manganese-based perovskite oxides, that enables them to dramatically change their electrical resistance in the presence of a magnetic field. The magnetoresistance of conventional materials enables changes in resistance of up to 5%, but materials featuring CMR may demonstrate resistance changes by orders of magnitude.

Method for patterning colossal magnetoresistance manganese oxide thin film on nanoscale

ActiveCN106252204ASolve the problem of poor etch rate ratioGood removal effectSemiconductor/solid-state device manufacturingResistMicro nano
The invention belongs to the technical field of micro-nano machining, and particularly provides a method for patterning a colossal magnetoresistance manganese oxide thin film on a nanoscale. The method comprises the steps of firstly carrying out spin-coating of electron beam photoresist on a strontium titanate substrate on which the colossal magnetoresistance manganese oxide thin film grows, carrying out baking and then exposing a required nanoscale graphic layout by use of an electron beam direct writing lithography; carrying out developing and fixing, obtaining a resist mask graphic of a required nanoscale graphic, depositing an aluminum metal thin film and then removing the resist to strip out an aluminum metal mask graphic; oxidizing an aluminum metal mask layer, transforming the aluminum metal mask layer into an aluminum oxide mask layer, and then etching the colossal magnetoresistance manganese oxide thin film by use of ion beams to form a colossal magnetoresistance manganese oxide graphic; and finally removing the aluminum oxide mask layer and cleaning the substrate. By the method, the problem that the etching rate ratio of electron beam resist to the colossal magnetoresistance manganese oxide layer during ion-beam etching is poor is solved; the thickness requirement of the electron beam resist is reduced; the resolution ratio of the electron beam direct-writing lithography is improved; and the problem that some electron beam resist cannot be easily removed after etching is also solved.
Owner:FUDAN UNIV

Device and method for measuring magnetic induction intensity based on colossal magnetoresistance effect

The invention relates to a device and a method for measuring magnetic induction intensity, in particular relates to a device and a method for measuring the magnetic induction intensity based on colossal magnetoresistance effect. The measuring device comprises an electromagnetic shielding device, a first loop and a second loop, wherein, the first loop comprises a colossal magnetoresistance device,a Helmholtz coil and a first power supply device; and the second loop comprises a Huygens electrical bridge and a second power source device. In the invention, the distinct effect of the colossal magnetoresistance effect is utilized, and the Helmholtz coil is adopted to provide the reversed magnetic field for balancing the magnetic field to be detected, when the Huygens electrical bridge is in balance, the numerical value of the magnetic field to be detected is equal to that of the Helmholtz coil, but the direction is reverse; and the resistance of a colossal magnetoresistance device needs not to be calculated, thus the accuracy and the precision of calculation is improved; the electromagnetic shielding device is adopted to shield the environmental magnetic field, thus the measuring environment with zero magnetic field intensity is provided, and non-interference basic parameters are provided for the follow-up measurement, thereby being beneficial for improving the accuracy of measurement.
Owner:STATE GRID CORP OF CHINA +2

Device and method for measuring magnetic induction intensity based on colossal magnetoresistance effect

The invention refers to a device and method for measuring magnetic induction intensity, especially to a device and method for measuring magnetic induction intensity based on the colossal magnetoresistive effect. The device includes an electromagnetic shielding device, a first loop and a second loop; the first loop includes a colossal magnetoresistive element, a Helmholtz coil and a first power supply device; the second loop includes a Huygens bridge and a second power supply device. The Helmholtz coil is utilized to supply a counter magnetic field by the use of significant action of the colossal magnetoresistive effect, so as to balance a magnetic field to be measured. When the Huygens bridge is balanced, the magnetic field to be measured is numerically equal to the magnetic field of the Helmholtz coil, but their directions are opposite, therefore, the device is not required to calculate the resistance of the colossal magnetoresistive element, thereby improving calculation accuracy and precision. The electromagnetic shielding device is utilized to effectively shield the environmental magnetic field, provide a measuring environment with zero magnetic field intensity, provide basic parameters without interference for the subsequent measuring, and improve the measuring accuracy.
Owner:STATE GRID CORP OF CHINA +2

A safety assessment method for zinc oxide demagnetization resistor components

The invention discloses a zinc oxide field suppression resistance assembly safety assessment method. As an accurate and unified assessment and calculation method based on zinc oxide field suppression resistance site testing data does not exist at present, after the data are measured, the characteristic change degrees and the variation trends of assemblies can only be roughly seen. According to the zinc oxide field suppression resistance assembly safety assessment method, a newly-defined zinc oxide field suppression resistance breakdown voltage safety critical index K is deduced for serving as a judgment basis, the safety critical index is converted into a corresponding safety critical value Kact through the adoption of the maximum assembly field suppression energy and the maximum assembly allowing energy, after the breakdown voltage of the assemblies is obtained through site measurement, only the ratio of the minimum actual measurement assembly breakdown voltage to the average other-assembly breakdown voltage needs to the calculated, and then the ratio is compared with the safety critical value to be capable of obtaining an assembly safety assessment conclusion. By means of the zinc oxide field suppression resistance assembly safety assessment method, the aims of assembly safety calculation and assembly safety assessment after zinc oxide field suppression resistance site measurement are achieved, and the accuracy of the safety calculation and assessment conclusion is improved.
Owner:STATE GRID CORP OF CHINA +1
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