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Epoxy acrylate based on cyclodextrin and preparing method thereof

A technology of epoxy acrylate and cyclodextrin, applied in cyclodextrin coatings and other directions, can solve the problems of high toxic skin irritation and low viscosity, and achieve the effects of low preparation cost, simple operation and good adhesion

Inactive Publication Date: 2015-04-01
HANGZHOU INST OF ADVANCED MATERIAL BEIJING UNIV OF CHEM TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Ordinary acrylate monomers have low viscosity and good adhesion, but are more toxic and irritating to the skin, such as isobutyl acrylate (IBA), cyclohexyl acrylate (CA), 2-ethyl acrylate Cyclohexyl ester (2-EHA), etc.

Method used

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  • Epoxy acrylate based on cyclodextrin and preparing method thereof
  • Epoxy acrylate based on cyclodextrin and preparing method thereof
  • Epoxy acrylate based on cyclodextrin and preparing method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0022] The first step reaction: mix 0.1mol cyclodextrin, 2mol epichlorohydrin and 0.3% mol tetrabutylammonium bromide of the reaction system, and add it to a condensing tube, a thermometer, a stirring rod and a constant pressure dropping funnel In a 250ml four-neck flask, the temperature was raised to 58°C with stirring, and NaOH solution (45wt%, 49g) was started to be added dropwise, and the drop rate was controlled at 2 drops / min, and the drop was completed in about 2 hours. After the dropwise addition, continue to stir for 4 hours to measure the epoxy value. When it reaches the maximum value, the reaction is terminated and cooled to room temperature. Post-processing: filter with suction to remove the NaCl crystals produced by the reaction, wash the organic phase twice with deionized water, and then dry it overnight with anhydrous sodium sulfate. Distill under reduced pressure to remove excess unreacted epichlorohydrin in the product.

[0023] The second step of reaction: t...

Embodiment 2

[0025] The first step reaction: mix 0.1mol cyclodextrin, 2.5mol epichlorohydrin and 0.3% mol tetramethylammonium chloride of the reaction system, and add to the In a 250ml four-necked flask with a funnel, stir and heat up to 58°C, start to add NaOH solution (45wt%, 49g) dropwise, the drop rate is controlled at 2 drops / min, and the drop is completed in about 2 hours. After the dropwise addition, continue to stir for 4 hours to measure the epoxy value. When it reaches the maximum value, the reaction is terminated and cooled to room temperature. Post-processing: filter with suction to remove the NaCl crystals produced by the reaction, wash the organic phase twice with deionized water, and then dry it overnight with anhydrous sodium sulfate. Distill under reduced pressure to remove excess unreacted epichlorohydrin in the product.

[0026] The second step reaction: take 0.05mol of the first step reaction product, add 2.5mol of acrylic acid to a three-necked flask, then add 1wt% hy...

Embodiment 3

[0028]The first step reaction: mix 0.1mol cyclodextrin, 3mol epichlorohydrin and 0.3% mol tetraethylammonium bromide of the reaction system, and add it to a condensing tube, a thermometer, a stirring rod and a constant pressure dropping funnel In a 250ml four-necked flask, stir and heat up to 58°C, start to add NaOH solution (45wt%, 98g) dropwise, the drop rate is controlled at 2 drops / min, and the drop is completed in about 2 hours. After the dropwise addition, continue to stir for 4 hours to measure the epoxy value. When it reaches the maximum value, the reaction is terminated and cooled to room temperature. Post-processing: filter with suction to remove the NaCl crystals produced by the reaction, wash the organic phase twice with deionized water, and then dry it overnight with anhydrous sodium sulfate. Distill under reduced pressure to remove excess unreacted epichlorohydrin in the product.

[0029] Second-step reaction: get 0.05mol of the first-step reaction product, add ...

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Abstract

The invention discloses an epoxy acrylate based on cyclodextrin and a preparing method of the epoxy acrylate. The structural formula of a monomer is shown as (1). The invention further discloses a method for preparing the monomer. According to the method, under the alkaline condition, the cyclodextrin and epoxy chloropropane react to generate a middle product, and the middle product and crylic acide carry out an open-loop esterification reaction to obtain the epoxy acrylate. The epoxy acrylate is provided with a roughly conical circular ring structure, in the photopolymerization process, the free size of a polymer can be larger, rotating of keys and moving of chains are stopped, the rigidity of molecules is improved, and therefore the size of the large monomer is reduced in the polymerization process; meanwhile, the epoxy acrylate is also a prepolymer containing polyhydroxy, and is low in volatility, large in adhesive force and good in adhesion. According to the method, the cyclodextrin and the epoxy chloropropane are selected as raw materials to prepare the polyfunctionality epoxy acrylate, reaction steps are few, and the preparation period is short; operation is simple, control is easy, by-products are few, wastewater treatment is not needed, and therefore the method is more suitable for industrial production.

Description

technical field [0001] The invention relates to the technical field of photosensitive polymer materials, in particular to a cyclodextrin-based epoxy acrylate as a photopolymerization prepolymer. Background technique [0002] The photopolymerization process refers to the process in which liquid oligomers (including monomers) undergo cross-linking polymerization to form solid products under the action of light (including ultraviolet light, visible light) or high-energy rays (mainly electron beams), triggering A chemically reactive liquid substance rapidly transforms into a solid state. At the North American Radiation Curing International Conference held in May 2004, the technology was summarized as having "5E" characteristics: efficient (Efficient), wide adaptability (Enabling), economical (Economical), energy saving (Energy Saving) and environmental friendliness (Environmental Friendly). At the same time, in November 2005, North American Radiation Curing Association (San Fr...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C08B37/16C09D105/16
Inventor 马贵平方大为聂俊
Owner HANGZHOU INST OF ADVANCED MATERIAL BEIJING UNIV OF CHEM TECH
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